Plasma Deposition Head with Split Gas Flow for Uniform ALD
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Solution Overview
Problem
Existing plasma sources for atomic layer deposition face challenges in achieving uniform mass flow of gas towards the substrate due to variations in gap width caused by manufacturing and thermal effects, leading to inefficiencies in deposition quality.
Innovation Solution
The plasma source design incorporates a gas supply system with divided mass flow channels on opposing sides of the electrode plate, which compensates for geometrical variations and thermal effects, ensuring a uniform mass flow of gas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If gas is supplied through a narrow gap along a high voltage electrode, then plasma source efficiency is improved, but gap width variations due to manufacturing tolerances cause non-uniform mass flow towards the substrate
Solution Approach 1:
The gas supply system is divided into multiple independent gas channels (first gas channel and second gas channel) that supply gas to opposite sides of the electrode plate separately. This segmentation allows independent control and compensation of flow resistance variations on each side, improving overall mass flow uniformity while maintaining the narrow gap configuration for plasma efficiency.
2Manufacturing precision
If gap width is reduced to improve mass flow uniformity, then deposition quality improves, but manufacturing and alignment tolerances make precise gap control difficult
Solution Approach 1:
The system incorporates flow resistance compensation mechanisms where flow resistance variations in one gas channel are compensated by corresponding variations in the other channel. This feedback-like compensation occurs naturally through the dual-channel design, allowing the system to self-correct for manufacturing tolerances without requiring ultra-precise gap control.
3Productivity
If plasma is generated inside the gap, then deposition process is enabled, but thermal gradients cause relative displacements and misalignments during operation
Solution Approach 1:
The gas supply and plasma generation are segmented into two independent channels on opposite sides of the electrode plate. This segmentation distributes thermal loads more evenly and allows independent thermal compensation, reducing the impact of thermal gradients on gap geometry stability while maintaining effective plasma deposition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design significantly improves the uniformity of the mass flow of gas, enhancing the deposition quality and efficiency of the plasma source by counteracting variations in flow resistance.
Implementation Method 1
a first flow of atmospheric plasma and a second flow of atmospheric plasma are provided from opposing sides of the electrode plate
Data Source
AI summary
A plasma source comprising a plasma deposition head, an electrode plate, and a gas supply system. The plasma deposition head comprises an aperture for delivering atmospheric plasma to a substrate, and a slotted cavity extending from the aperture. The electrode plate is mounted in the slotted cavity and extends from an interior of the deposition head towards the aperture. The gas supply system comprises a gas inlet, a gas supply chamber and gas outlets. The gas supply chamber is arranged for receiving a mass flow of gas from the gas inlet and dividing the mass flow of gas between the gas outlets. The gas outlets are provided on opposing sides of the electrode plate. In use, the mass flow of gas is divided for providing a flow of atmospheric plasma on the opposing sides of the electrode plate.