Plasma Ignition Control Using Sensed Discharge Status
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for initiating plasma discharge often cause device damage and introduce impurities due to inadequate consideration of plasma occurrence states.
Innovation Solution
A plasma generation device and control method that includes a chamber, an antenna module, an electrode, a sensor, and a controller, which applies RF voltage, obtains sensing information, and controls power sources based on plasma status to minimize device damage and impurity production during initial discharge.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional ignition methods (ignitor or high power input) are used to assist initial plasma discharge, then plasma discharge is achieved, but device damage occurs and impurities are introduced to active species
Solution Approach 1:
The system performs preliminary sensing of plasma occurrence state before applying high power or ignitor assistance. The controller continuously monitors plasma generation status and only applies assistance measures when plasma is not yet generated, preventing device damage and impurity production while ensuring reliable plasma discharge achievement
Solution Approach 2:
The system implements a feedback control mechanism where the controller senses plasma occurrence state in real-time and adjusts power input and ignitor assistance accordingly. This feedback loop ensures plasma discharge is achieved while minimizing harmful effects by applying assistance measures only when necessary
2Productivity
If high power is input to achieve initial plasma discharge, then plasma is generated, but device damage occurs
Solution Approach 1:
The system performs preliminary sensing to detect plasma occurrence state before applying high power. By checking whether plasma is already generated and only applying high power when necessary, the system achieves rapid plasma generation while preventing device damage from excessive power input
Solution Approach 2:
The system dynamically adjusts power input levels based on real-time plasma occurrence state sensing. The controller modifies power delivery according to actual plasma conditions, enabling fast plasma generation when needed while protecting device durability through adaptive power management
3Reliability
If ignitor is used to assist initial plasma discharge, then plasma discharge is achieved, but impurities are introduced to active species
Solution Approach 1:
The controller uses real-time sensing feedback to determine when plasma has been successfully generated. Based on this feedback, the ignitor is activated only during the specific period when plasma is not yet generated, ensuring reliable plasma discharge while preventing impurity introduction to active species
Solution Approach 2:
The system performs preliminary sensing to identify the exact moment when plasma generation is needed. The ignitor is applied as a preliminary assistance measure only during the window before plasma self-sustains, achieving reliable plasma discharge without introducing impurities to the active species
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables rapid plasma discharge with reduced impurity production by dynamically controlling power sources based on plasma status, ensuring efficient and safe plasma generation.
Implementation Method 1
The inductively coupled plasma method is a method of forming an induced electric field by applying RF power to a coil and of performing plasma discharge through the induced electric field
Implementation Method 2
a sensor configured to obtain sensing information related to a status of the plasma
Data Source
AI summary
According to one embodiment of the present specification, there can be provided an apparatus for generating plasma, comprising: a chamber configured to provide a generating space for the plasma; an antenna module placed adjacent to the chamber and configured to be connected to a first power source and generate induced electric field in the chamber; an electrode placed adjacent to the chamber and configured to be connected to a second power source and assist in a generation of the plasma; a sensor configured to obtain sensing information related to a status of the plasma; and a controller configured to control the first power source and the second power source.