Plasma Imaging Measurement for Nonintrusive Parameter Estimation
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Solution Overview
Problem
Existing technologies face challenges in easily and efficiently acquiring plasma parameters, which are crucial for plasma processing but often require expensive and complex measurement devices or methods that disrupt the plasma state.
Innovation Solution
A measurement system comprising an imaging device and a plasma processing device, where the imaging device generates optical information from imaged plasma, and a controller converts this optical information into plasma parameters using correlation information stored in a database.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional measurement devices or methods are used to acquire plasma parameters, then measurement precision can be maintained, but device complexity and cost increase significantly
Solution Approach 1:
The patent uses optical imaging to create a visual copy of the plasma state, capturing light emission patterns from the plasma. This optical copy is then processed through machine learning models that have been trained to map these visual patterns to actual plasma parameters, replacing complex physical measurement devices with a computational approach that maintains measurement precision while reducing device complexity
Solution Approach 2:
The patent replaces traditional mechanical or physical measurement systems (such as probes or spectrometers) with an optical-based imaging system combined with computational algorithms. The imaging device captures light emission from the plasma, and machine learning models process this optical information to derive plasma parameters, substituting complex mechanical measurement systems with a simpler optical-computational system
2Measurement precision
If traditional plasma measurement methods are employed, then accurate plasma parameters can be obtained, but the plasma state is disturbed
Solution Approach 1:
The patent introduces light emission as an intermediary between the plasma and the measurement system. Instead of directly interacting with the plasma using probes or other intrusive devices, the system captures the natural light emitted by the plasma. This optical intermediary allows measurement of plasma parameters without direct physical contact, thereby avoiding disturbance to the plasma state while maintaining measurement accuracy through machine learning-based analysis
3Measurement precision
If complex measurement systems are used to acquire plasma parameters, then measurement precision is maintained, but productivity decreases due to time consumption and operational complexity
Solution Approach 1:
The patent performs preliminary training of machine learning models using extensive plasma data before actual measurement. Once trained, these models can rapidly process new imaging data and provide plasma parameter estimates in real-time or near-real-time. This preliminary computational work enables fast, accurate measurements during actual plasma processing operations, significantly improving productivity while maintaining measurement precision
Solution Approach 2:
The patent transforms the measurement approach by changing from direct physical parameter measurement to optical parameter capture followed by computational transformation. The imaging device captures light intensity and distribution parameters, which are then transformed through machine learning models into plasma physical parameters. This parameter transformation approach enables faster measurements and improves processing efficiency while maintaining accuracy
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables easy and efficient acquisition of plasma parameters, allowing for simple, high-speed estimation of three-dimensional plasma parameters without disturbing the plasma, thereby improving plasma processing efficiency and quality.
Implementation Method 1
a plasma generator configured to generate plasma from a gas supplied into a processing chamber
Implementation Method 2
the imaging device is configured to generate optical information of the plasma from image data of imaged plasma in the processing chamber
Data Source
AI summary
A measurement system including an imaging device and a plasma processing device having a plasma generator configured to generate plasma from a gas supplied into a processing chamber and a controller. The imaging device is configured to generate optical information of the plasma from image data of imaged plasma in the processing chamber, and the controller is configured to convert the generated optical information of the plasma into a plasma parameter that determines physical characteristics of the plasma with reference to a storage that stores correlation information between the optical information of the plasma and measurement results of the plasma parameter.