Plasma Boundary Limiter Plates for Leakage Control
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Solution Overview
Problem
Conventional substrate treatment apparatuses using plasma confinement rings face challenges in preventing plasma leakage, controlling plasma density, and efficiently loading/unloading substrates due to complex structures and high loads on ring drivers.
Innovation Solution
A plasma boundary limiter unit with a novel ring-shaped structure comprising multiple plates spaced along the circumference, allowing gas to flow out through passages, and a coupling member to reduce plasma leakage and enable controlled plasma density, integrated with a door assembly for simplified substrate handling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional confinement rings are used to prevent plasma leakage, then plasma containment is improved, but the structure becomes complicated and requires additional ring drivers
Solution Approach 1:
The confinement ring is divided into multiple separate plates arranged circumferentially with gaps between them. These plates are coupled to the door assembly instead of requiring a separate ring driver, simplifying the overall structure while maintaining plasma containment effectiveness.
Solution Approach 2:
The confinement ring structure is merged with the door assembly by coupling the plates to the door assembly. This integration eliminates the need for a separate ring driver mechanism, reducing device complexity while maintaining the plasma containment function.
2Reliability
If multiple confinement rings are used to control plasma density, then plasma density control is improved, but the structure becomes more complex
Solution Approach 1:
Different regions of the plasma boundary are controlled by individually adjustable plates. Each plate can be positioned independently to control plasma density in its specific region, allowing localized plasma density control without requiring multiple complete confinement rings.
Solution Approach 2:
The plates are designed to be movable and adjustable, allowing dynamic control of plasma density in different regions. The plates can be positioned at different heights and angles to optimize plasma confinement and density control during the substrate treatment process.
3Ease of operation
If confinement rings are moved to standby position for substrate loading, then substrate handling is enabled, but the number of processes increases
Solution Approach 1:
The confinement ring plates are coupled to the door assembly, so that the same actuator that opens/closes the door also moves the confinement plates. This eliminates the need for a separate ring driver and reduces the number of processes required for substrate loading and unloading.
Solution Approach 2:
The door assembly serves multiple functions: it opens/closes the process chamber for substrate handling and simultaneously positions the confinement ring plates. This multi-functionality reduces the overall process time and simplifies the control system.
4Reliability
If ring driver vertically moves all confinement rings, then plasma containment is maintained, but large load is applied to the ring driver
Solution Approach 1:
The confinement ring is segmented into multiple plates that can be moved independently or in groups. This segmentation distributes the load across multiple smaller components rather than requiring a single large ring driver to move the entire confinement ring, reducing the force requirement on each actuator.
Solution Approach 2:
The plates are designed with movable joints and coupling mechanisms that allow them to be positioned with smaller forces. The dynamic positioning system uses multiple degrees of freedom to reduce the mechanical advantage required, thereby reducing the load on actuators compared to moving a rigid entire ring structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents plasma leakage, controls plasma density, reduces the number of processes and time for substrate loading/unloading, and decreases the load on moving parts, enhancing the efficiency and simplicity of substrate treatment apparatuses.
Implementation Method 1
a plasma generation unit for generating plasma from the process gas; and a plasma boundary limiter unit disposed within the process chamber to surround a discharge space defined above the support unit, the plasma boundary limiter unit minimizing the plasma from leaking from the discharge space
Data Source
AI summary
Provided is an apparatus for treating a substrate. The apparatus comprises a plasma boundary limiter unit disposed within a process chamber to surround a discharge space defined above a support unit. The plasma boundary limiter unit comprises a plurality of plates disposed along a circumference of the discharge space, and the plurality of plates are spaced apart from each other along the circumference of the discharge space so that a gas within the discharge space flows to the outside of the discharge space through passages provided between the adjacent plates.