In-situ Plasma Cleaning for Mass Spectrometer Internal Surfaces
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Solution Overview
Problem
Conventional mass spectrometry systems require frequent shutdowns and disassembly for external cleaning of internal surfaces, leading to significant operational downtime, mechanical wear, and exposure to hazardous solvents, due to the accumulation of residual material and electrical charging that disrupts ion transmission.
Innovation Solution
Integration of a plasma cleaning system within the mass spectrometry system that generates plasma to clean internal surfaces in situ, allowing for switching between analytical and cleaning modes without breaking vacuum, using a plasma source to contact and remove contaminants from internal surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional external cleaning methods are used, then contaminated surfaces can be cleaned, but the system requires shutdown and disassembly resulting in significant operational downtime
Solution Approach 1:
The patent replaces mechanical cleaning methods (disassembly, manual cleaning, reassembly) with a plasma-based cleaning system that uses electromagnetic energy to generate plasma for in-situ cleaning. The plasma source generates reactive species that chemically clean internal surfaces without requiring mechanical access or system disassembly, thereby eliminating operational downtime while maintaining cleaning effectiveness
Solution Approach 2:
The patent introduces plasma as an intermediary substance between the cleaning system and the contaminated surfaces. The plasma, generated within the vacuum chamber, serves as a mediator that can access and clean internal surfaces through chemical reactions without requiring direct mechanical contact or system opening, thus resolving the contradiction between cleaning access and system operational continuity
2Reliability
If conventional external cleaning methods are used, then contaminated surfaces can be cleaned, but mechanical disassembly and reassembly cause wear and fatigue on components
Solution Approach 1:
The patent eliminates mechanical disassembly and reassembly operations by using plasma to clean surfaces in-situ. The plasma cleaning system uses electromagnetic fields to generate reactive species that chemically clean internal surfaces without any mechanical contact, mounting, or alignment operations, thereby completely preventing mechanical wear and fatigue on components
3Reliability
If conventional external cleaning methods are used, then contaminated surfaces can be cleaned, but hazardous solvents and compounds must be used
Solution Approach 1:
The patent replaces chemical solvent-based cleaning with plasma-based cleaning. The plasma, generated from inert or reactive gases, provides a chemical cleaning mechanism that does not require hazardous liquid solvents. The reactive species in the plasma chemically react with and remove contaminants without leaving harmful residues, eliminating exposure risks to users while maintaining cleaning effectiveness
Solution Approach 2:
The patent changes the physical and chemical parameters of the cleaning process by using plasma at controlled temperatures and pressures within the vacuum chamber. This parameter change allows cleaning to occur in a controlled environment without requiring hazardous solvents, transforming the cleaning mechanism from liquid-chemical to plasma-chemical processes that are safer and more environmentally friendly
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables continuous operation with reduced downtime and mechanical stress, while eliminating the need for hazardous solvents by effectively removing contaminants and maintaining ion transmission efficiency.
Implementation Method 1
generating plasma by operating a plasma source of the MS system; and contacting an internal surface of the MS system with the plasma to clean the internal surface
Data Source
AI summary
A mass spectrometry (MS) system may be cleaned by generating plasma and contacting an internal surface of the system to be cleaned with the plasma. The system may be switched between operating in an analytical mode and in a cleaning mode. In the analytical mode a sample is analyzed, and plasma may or may not be actively generated. In the cleaning mode the plasma is actively generated, and the sample may or may not be analyzed.