Switchable Plasma Match Network for Multi-State Impedance Matching

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Solution Overview

Problem

Conventional match networks in plasma processing systems struggle with impedance matching for multiple impedance states introduced by multi-pulsing, leading to inefficiencies and wear on variable capacitor components.

Innovation Solution

A match network incorporating a variable capacitance and one or more solid-state capacitances switchably in parallel, controlled by a controller to impedance match to multiple plasma load states, reducing the need for continuous variable capacitor adjustments.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional match networks use a variable capacitor adjusted continuously or frequently to compensate for small variations in load impedance, then impedance matching is maintained, but the leadscrew of the variable capacitor wears over time and the lifetime of the capacitor is reduced

Engineering Contradiction:
Improvecapacitor lifetimeVSAvoidimpedance matching capability
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

The match network divides the capacitance adjustment function into two segments: a variable capacitor for fine-tuning and an array of solid-state capacitors for coarse adjustment. This segmentation allows the variable capacitor to operate within a limited range without frequent large adjustments, reducing leadscrew wear while maintaining impedance matching capability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The solid-state capacitors act as intermediaries between the generator and the variable capacitor. By switching solid-state capacitors in or out of the circuit, the system can make discrete capacitance changes without requiring the variable capacitor to be adjusted frequently, thereby protecting the variable capacitor from excessive wear.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Adaptability or versatility

If conventional match networks are designed for single impedance state, then the structure is simple, but they are insufficient for impedance matching to multiple impedance states created by multi-pulsing

Engineering Contradiction:
Improvemulti-impedance state matchingVSAvoidmatch network structure
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The match network incorporates dynamically switchable solid-state capacitors that can be configured in or out of parallel arrangement with the variable capacitor. This dynamic configuration allows the system to adapt to multiple impedance states generated by multi-pulsing while maintaining a relatively compact structure.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The match network is designed to perform multiple functions: it can match a first impedance state using the variable capacitor alone, and switch to matching a second impedance state by engaging solid-state capacitors in parallel. This multi-functionality enables the system to handle various plasma load conditions with a single integrated circuit.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20250183006A1Match network with variable capacitance and switchable array of solid-state capacitance
Publication Date: 2025.06.05 ADVANCED ENERGY IND INC
  • US20250183006A1 patent drawing
  • US20250183006A1 patent drawing
  • US20250183006A1 patent drawing

AI summary

A match network with variable capacitance and a switchable array of solid-state capacitance. In one embodiment, a match network includes a variable capacitance and one or more solid-state capacitances switchably in parallel with the variable capacitance. The match network also includes a controller configured to control the variable capacitance to impedance match to a first impedance state of a plasma load, and to switch at least one solid-state capacitance into or out of parallel arrangement with the variable capacitance to impedance match to a second state of the plasma load.