Plasma Mounting Table Temperature Control via Heat Input Calculation
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Solution Overview
Problem
Temperature control of a mounting table in plasma processing apparatuses becomes difficult when high frequency power is applied, as the output value of the heater decreases due to unsettled heat input from plasma, leading to uncontrollable temperature increases.
Innovation Solution
A temperature control method that calculates the heat input amount based on high frequency power using a data table and adjusts the temperature of the heating and cooling mechanisms to maintain a controllable temperature difference, ensuring the heater's output remains above zero and stabilizes temperature control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If high frequency power is applied in plasma processing, then plasma generation is achieved, but heat input to the mounting table becomes unsettled causing temperature control difficulty
Solution Approach 1:
The control unit calculates the heat input amount from plasma in advance based on the applied high frequency power using a pre-stored data table, and determines the heater output value before actually applying the power. This preliminary calculation allows the system to prepare the appropriate heating compensation in advance, preventing temperature control issues before they occur.
Solution Approach 2:
The system uses a data table that stores the relationship between high frequency power and heat input amount, which was created through preliminary measurements. During operation, the control unit continuously adjusts the heater output based on the calculated heat input from plasma, creating a closed-loop feedback system that maintains stable temperature control despite varying plasma conditions.
2Temperature
If heater output is increased to compensate for plasma heat input, then temperature control is improved, but heater output may become zero when plasma heat input is high
Solution Approach 1:
The system dynamically adjusts the heater output parameter based on the calculated heat input amount from plasma. By changing the heater power level according to the plasma conditions (which vary with high frequency power), the system maintains optimal temperature control without the heater output dropping to zero, as the preliminary calculation ensures appropriate compensation is applied.
3Stability of the object's composition
If temperature control is attempted during high frequency power application, then temperature stability is desired, but control becomes difficult due to unsettled heat input
Solution Approach 1:
By calculating the required heater output in advance based on the known relationship between high frequency power and heat input (stored in the data table), the system eliminates the need for reactive temperature adjustments. This preliminary determination of heating requirements simplifies the control process and ensures temperature stability without complex real-time adjustments.
Solution Approach 2:
The control unit continuously monitors the applied high frequency power and adjusts the heater output accordingly using the pre-established relationship data. This feedback mechanism maintains temperature stability automatically, making the control process easier and more reliable without requiring manual intervention or complex control algorithms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method improves the controllability of the mounting table's temperature, preventing heater output from becoming zero and maintaining stable temperature control during plasma processing.
Implementation Method 1
a cooling mechanism for cooling the mounting table
Implementation Method 2
a cooling mechanism for cooling the mounting table
Implementation Method 3
a first heating mechanism for heating the mounting table
Implementation Method 4
heat input from plasma generated in the plasma processing apparatus
Data Source
AI summary
A method for controlling the temperature of a mounting table in a plasma processing apparatus, includes: calculating a first heat input amount according to high frequency power applied in a given process, wherein the first heat input amount is calculated based on a data table, the data table being generated by measuring temperatures so as to find a first relationship between the high frequency power applied in the plasma processing apparatus and the heat input amount to the mounting table; controlling, based on an operation map, the temperature of at least one of the first heating mechanism and the cooling mechanism so that a first temperature difference between the cooling mechanism and the first heating mechanism is within a controllable range corresponding to the first heat input amount, wherein the temperature of the first heating mechanism is controllable upon the first temperature difference falling within the controllable.