Plasma Chamber Gas Nozzle Structure to Prevent Abnormal Discharge
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in efficiently supplying gases while preventing abnormal discharges due to microwave propagation, particularly at the gas nozzle ends, which can affect film formation processes.
Innovation Solution
The apparatus incorporates a gas supply structure with protrusions and recesses on the ceiling and sidewalls, featuring cartridge-type gas nozzles with dimple-shaped gas holes and degassing grooves to prevent microwave interference and clogging, ensuring even gas distribution and preventing abnormal discharges.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If gas nozzles protrude from the ceiling wall and/or sidewall with gas supply holes, then gas supply efficiency is improved, but abnormal discharges may occur during microwave propagation
Solution Approach 1:
The patent introduces a ceiling block with a gas supply chamber as an intermediary structure between the microwave field and the gas nozzles. This ceiling block serves as a mediator that distributes gas through multiple holes while shielding the nozzle structure from direct microwave exposure, thereby preventing abnormal discharges while maintaining efficient gas supply
Solution Approach 2:
The patent extracts the gas supply function from the traditional nozzle structure and relocates it to a ceiling block with integrated gas supply holes. By separating the gas distribution function from the microwave-exposed components, the system achieves efficient gas supply without the harmful abnormal discharges that occur in conventional protruding nozzle designs
2Ease of operation
If a shower plate with gas holes and supply nozzles is used, then gas distribution is improved, but the structure complexity increases
Solution Approach 1:
The patent merges the gas distribution function with the ceiling block structure itself. The ceiling block integrates multiple gas supply holes directly into its design, eliminating the need for separate shower plates and supply nozzles. This consolidation maintains effective gas distribution while significantly reducing structural complexity
Solution Approach 2:
The ceiling block serves multiple functions simultaneously: it acts as the microwave waveguide structure, provides gas distribution through integrated holes, and serves as the mounting structure for the plasma processing apparatus. This multi-functionality eliminates the need for separate gas supply components, reducing overall system complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances gas supply efficiency, prevents abnormal discharges, and maintains uniform gas distribution, thereby improving the reliability and quality of film formation processes in plasma processing.
Implementation Method 1
a power supply configured to supply radio frequency or microwave power for generating plasma in the process container
Implementation Method 2
Each of the plurality of gas nozzles has a gas flow passage therein, and each of the plurality of protrusions has a gas hole at a leading end of the protrusion
Data Source
AI summary
A plasma processing apparatus includes a process container, a power supply configured to supply radio frequency or microwave power for generating plasma in the process container, a plurality of gas nozzles, each having a gas flow passage therein, and a plurality of protrusions formed integrally with a ceiling wall and/or a sidewall that defines the process container, the plurality of protrusions protruding from the ceiling wall and/or the sidewall. Each of the plurality of protrusions has a gas hole at a leading end of the protrusion. The ceiling wall and/or the sidewall has recesses in which the plurality of gas nozzles is arranged, respectively, such that the gas flow passage of each of the plurality of gas nozzles communicates with the gas hole of each of the plurality of protrusions.