Plasma Observation Windows for Accurate End Point Detection
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Solution Overview
Problem
Current plasma observation systems lack efficient methods for accurately determining the end point of plasma processing, particularly in plasma processing apparatuses where multiple observation points are needed to monitor plasma states across various directions, leading to incomplete processing and potential overetching.
Innovation Solution
A plasma observation system with a measuring device that includes a light receiver capable of receiving multiple intersecting light beams through observation windows, allowing the controller to specify observation points and determine plasma states, thereby enabling precise end point detection and process control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple observation windows are used to monitor plasma states from various directions, then measurement precision and reliability are improved, but device complexity increases
Solution Approach 1:
The patent combines multiple light receivers into a single integrated device that can receive light beams through multiple observation windows. The light receiver is configured to simultaneously receive light beams from different directions and specify observation points by analyzing the spatial distribution of received light, thereby achieving multi-point plasma monitoring without proportionally increasing the number of separate receivers.
Solution Approach 2:
The light receiver is designed with multi-functional capability to perform multiple tasks: receiving light beams through different observation windows, specifying multiple observation points, and determining plasma states at various locations. This universal design allows a single device to replace what would traditionally require multiple specialized receivers.
2Measurement precision
If multiple light receivers are deployed to monitor multiple observation points, then measurement precision is improved, but cost and device complexity increase
Solution Approach 1:
The patent merges the functions of multiple light receivers into a single integrated receiver that can simultaneously monitor multiple observation points. The receiver specifies observation points by analyzing the spatial characteristics of received light beams and determines plasma states at these points, achieving multi-point monitoring with a single device rather than requiring multiple separate receivers.
3Device complexity
If traditional single-point observation is used, then device complexity is reduced, but manufacturing precision and processing quality deteriorate due to incomplete plasma monitoring
Solution Approach 1:
The patent transitions from single-point observation to multi-dimensional plasma monitoring by enabling the light receiver to specify multiple observation points in different spatial locations within the processing chamber. This dimensional expansion allows comprehensive plasma state monitoring throughout the chamber, ensuring uniform processing quality and preventing localized defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for accurate detection of plasma processing end points, ensuring complete processing without overetching, and enables efficient control of plasma conditions, improving the overall processing quality and reducing costs by sharing light receivers across multiple observation windows.
Implementation Method 1
detecting the light of a predetermined wavelength emitted from plasma
Implementation Method 2
a light receiver configured to receive a plurality of light beams intersecting in the processing container
Data Source
AI summary
A plasma observation system includes a plasma processing apparatus which includes a processing container in which a substrate is processed with plasma, and a plurality of observation windows each capable of observing an emission state of the plasma in the processing container; and a measuring device including a light receiver configured to receive a plurality of light beams intersecting in the processing container through a plurality of observation windows, and a controller configured to specify an observation point of the plasma and determine a state of the plasma at the observation point based on the plurality of light beams received by the light receiver.