Plasma Processing Apparatus Peripheral Introduction Part Thermal Expansion

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Solution Overview

Problem

The existing plasma processing apparatus faces issues with thermal expansion of the ring-shaped peripheral introduction part, leading to potential misalignment and reduced uniformity in plasma processing, and has maintenance challenges due to its complex design.

Innovation Solution

The apparatus features a peripheral introduction part assembled from two members that can thermally expand uniformly, with a gas flow path that can be easily cleaned, and is thermally and electrically connected to the container, allowing for improved maintainability and alignment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stability of the object's composition

If the peripheral introduction part is fixed rigidly to prevent movement, then alignment stability is improved, but thermal expansion causes misalignment and reduces plasma processing uniformity

Engineering Contradiction:
Improvealignment stabilityVSAvoidplasma processing uniformity
Core Design Contradiction:
Stability of the object's compositionVSManufacturing precision

Solution Approach 1:

The peripheral introduction part is designed to be movable relative to the container along the radial direction, allowing it to expand thermally without causing misalignment. The movable structure includes a movable part that can shift radially and a fixing part that can be positioned at different axial positions, enabling the system to accommodate thermal expansion dynamically while maintaining alignment stability.

Inventive Principle:
Principle #15Dynamics

2Stability of the object's composition

If the peripheral introduction part is designed as a complex fixed structure, then structural stability is improved, but maintenance difficulty increases

Engineering Contradiction:
Improvestructural stabilityVSAvoidmaintenance difficulty
Core Design Contradiction:
Stability of the object's compositionVSEase of repair

Solution Approach 1:

The peripheral introduction part is divided into a movable part and a fixing part that can be separated from each other. The movable part can be detached and removed independently for maintenance, cleaning, or replacement, while the fixing part remains in place. This segmentation allows easy maintenance while maintaining structural stability during operation.

Inventive Principle:
Principle #1Segmentation

3Device complexity

If the peripheral introduction part is made as a single integrated component, then device complexity is reduced, but thermal expansion causes misalignment

Engineering Contradiction:
Improvestructure complexityVSAvoidalignment precision
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The peripheral introduction part is designed with movable and fixing parts that can move relative to each other along the radial direction. This dynamic structure allows the movable part to expand thermally without causing misalignment, as the movement is accommodated by the movable structure rather than being constrained by a rigid fixed connection.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution ensures uniform thermal expansion, maintains plasma processing uniformity, and enhances the maintainability of the peripheral introduction part by allowing for easy disassembly and alignment of components.

Implementation Method 1

the peripheral introduction part is an assembly in which at least two members are assembled, and a gas flow path extending in a circumferential direction with respect to an axis passing through a center of the stage is formed in an interior of the at least two members... the peripheral introduction part, the container upper portion and the container lower portion are thermally and electrically connected to each other

Methodology Applied
Scientific EffectThermal expansion: Thermal Expansion

Data Source

PatentUS11056318B2Plasma processing apparatus
Publication Date: 2021.07.06 TOKYO ELECTRON LTD
  • US11056318B2 patent drawing
  • US11056318B2 patent drawing
  • US11056318B2 patent drawing

AI summary

A plasma processing apparatus includes: a processing container formed by assembling a container upper portion having an upper side wall and a container lower portion having a lower side wall; a stage provided in the container lower portion of the processing container; and a peripheral introduction part configured to be an assembly, configured to be sandwiched between the upper side wall and the lower side wall, and configured to provide a plurality of gas discharge ports arranged in the circumferential direction with respect to an axis passing through a center of the stage, the assembly in which at least two members are assembled, the at least two members forming a gas flow path extending in a circumferential direction with respect to the axis in an interior thereof, in which the peripheral introduction part, the container upper portion and the container lower portion are thermally and electrically connected to each other.