Plasma Glow Discharge Positioning via RF Phase Control
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Solution Overview
Problem
Current plasma-enhanced chemical vapor deposition (PECVD) and plasma-enhanced atomic layer deposition (PEALD) systems face challenges in controlling the positioning of plasma glow discharge between electrodes, as existing methods rely on multiple frequencies and/or generators, which are inefficient in directing the plasma bulk to specific regions within the chamber.
Innovation Solution
The method involves controlling the phase difference of radio frequency (RF) signals supplied to both the top and bottom electrodes in a plasma chamber, allowing for adjustable positioning of the plasma glow discharge between the electrodes or proximate to the chamber walls by adjusting the phase difference between the RF signals delivered to the top and bottom electrodes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple frequencies and/or multiple RF generators are used to control glow discharge, then the ability to influence plasma positioning in different regions is improved, but the device complexity increases
Solution Approach 1:
The patent applies parameter changes by controlling the phase difference between RF signals supplied to top and bottom electrodes. By adjusting the phase difference parameter, the plasma glow discharge positioning can be controlled without changing the number of RF generators, thus resolving the contradiction between adaptability and device complexity
Solution Approach 2:
A single RF generator is made multi-functional by enabling it to control plasma positioning in different regions through phase difference adjustment. This allows one generator to perform multiple positioning functions that would traditionally require multiple generators, reducing device complexity while maintaining versatility
2Manufacturing precision
If RF signal phase difference is controlled to position plasma away from electrodes, then deposition uniformity is improved, but the control precision requirements increase
Solution Approach 1:
The patent implements feedback control by monitoring plasma positioning and adjusting the phase difference accordingly. This feedback mechanism enables precise control of plasma position to achieve uniform deposition while compensating for variations, thus managing the precision requirements effectively
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise control over the plasma glow discharge, allowing it to be focused between electrodes or directed towards the chamber walls, enhancing deposition uniformity, reducing parasitic plasma, and optimizing chamber cleaning, thereby improving the efficiency and effectiveness of the deposition process.
Implementation Method 1
providing power to one or more electrodes of a chamber... A radio frequency (RF) generator is connected to a top electrode of a chamber... The RF generator is connected to a bottom electrode of the chamber
Implementation Method 2
strike a plasma from gases introduced into the chamber, which is referred to herein as the plasma glow discharge that results from providing power to one or more electrodes of a chamber
Implementation Method 3
Control of the phase difference assists in controlling positioning of the plasma glow discharge from being substantially between the top and bottom electrodes to being away from the top and bottom electrodes and proximate to chamber walls of the chamber
Data Source
AI summary
Methods for controlling glow discharge in a plasma chamber are disclosed. One method includes connecting a radio frequency (RF) generator to a top electrode of a chamber, the chamber having chamber walls coupled to ground and connecting the RF generator to a bottom electrode of the chamber. Identifying a process operation of deposition to be performed in the chamber and setting an RF signal from the RF generator to be supplied to the top electrode at a first phase. And, setting the RF signal from the RF generator to be supplied to the bottom electrode at a second phase. The first phase and the second phase being adjustable to a phase difference to cause the plasma glow discharge to be controllably positioned within the chamber based on the phase difference.