Pulsed Laser Deposition Plume Superposition for Throughput
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current pulsed laser deposition methods for thin film production, such as those used for superconducting materials, face limitations in processing throughput and cost due to moderate increases in deposition speed at high repetition rates, with existing multi-plume arrangements not effectively enhancing deposition rate without compromising thickness homogeneity.
Innovation Solution
Spatial and temporal superposition of multiple plasma plumes created by multiple laser beams, with targeted gas-dynamical interaction between plumes, increases the total material flow and deposition rate beyond the number of laser beams used, achieving a throughput enhancement of up to 2N to 3N, and reducing angular divergence of the material flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple laser beams are used to create multiple plasma plumes, then deposition rate increases, but thickness homogeneity deteriorates
Solution Approach 1:
The patent merges multiple plasma plumes created by separate laser beams into a single composite plume structure. By positioning target spots at specific distances (0.5-2.0 mm) that allow plasma plumes to overlap and interact, the individual plumes combine to form a unified material flow toward the substrate. This merging effect maintains thickness homogeneity while achieving higher deposition rates proportional to the number of laser beams used.
Solution Approach 2:
The patent introduces gas-dynamical interaction as an intermediary mechanism between multiple plasma plumes. The gas phase serves as a medium that facilitates the interaction and merging of plumes from different target spots, enabling coherent material transport to the substrate. This intermediary effect allows multiple plumes to work together synergistically rather than independently, resolving the contradiction between increased deposition rate and maintained homogeneity.
2Productivity
If laser repetition rate is increased to improve throughput, then deposition speed increases moderately, but target surface quality deteriorates
Solution Approach 1:
The patent segments the target surface into multiple distinct target spots, each subjected to independent laser ablation. By distributing the laser pulses across multiple locations rather than repeatedly ablating the same spot, the target surface is refreshed more evenly, preventing degradation while maintaining high deposition throughput. The segmentation allows each spot to be utilized before significant surface quality deterioration occurs.
Solution Approach 2:
The patent implements periodic scanning of laser beams across multiple target spots on the target surface. This periodic action ensures that no single location is over-ablated, maintaining target surface quality while achieving high throughput through systematic coverage of multiple spots in sequence and parallel.
3Manufacturing precision
If multiple plasma plumes are created at large distances, then thickness uniformity is maintained, but deposition rate does not increase
Solution Approach 1:
The patent optimizes the distance parameter between target spots to a specific range (0.5-2.0 mm) that enables gas-dynamical interaction between plasma plumes. This parameter change allows plumes to be close enough to interact and merge for enhanced material flow, yet far enough to maintain individual plume structure and thickness uniformity. The optimized distance parameter resolves the trade-off between uniformity and deposition rate enhancement.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method significantly increases processing throughput and reduces costs by enhancing material deposition efficiency through gas-dynamical interaction between plasma plumes, achieving higher material yield and improved uniformity in film deposition.
Implementation Method 1
focusing a laser beam to a target of the material to be deposited. This target-material is ablated from the target in form of a plasma plume
Implementation Method 2
the target is ablated and at least two plasma plumes are created, wherein the plasma plumes create a flow of target material towards the substrate and the target material is deposited onto the substrate
Data Source
Figure 1a~1b
Figure 1c
Figure 2~3
AI summary
The invention concerns a method for film deposition on a substrate (16) by means of pulsed laser deposition, the method comprising: generating at least two pulsed laser beams (4, 5, 6) by means of at least one laser (1), directing the at least two laser beams (4, 5, 6) to different target spots (9, 10, 11) of a target (12), whereby the target (12) is ablated and at least two plasma plumes (13) are created, wherein the plasma plumes (13) create a flow of target material which is to the substrate (16) and the target material is deposited onto the substrate (16) at an deposition area (24), the method being characterized in that the plasma plumes (13) created by the at least two laser beams (4, 5, 6) are spatially and temparally superimposed, and that the target spots (9, 10, 11) are separated from each other at a distance that allows a gas-dynamical interaction of the created plasma plumes (13).