Plasma Poling Layout for Uniform Large-Area Polymer Thin Films

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Solution Overview

Problem

The existing poling processes for polymer thin films are slow and inefficient, limiting the production of electroactive materials used in sensors, actuators, and transducers, as they can only polarize one film at a time and lack the capability for large-area, uniform, and fast polarization.

Innovation Solution

A plasma poling apparatus and method that includes a poling chamber, workpiece, and carrier platform with grounding electrodes and pads, allowing for the simultaneous polarization of multiple areas and enabling the use of modularized, arrayed poling sources to achieve uniform and damage-free poling of large-area polymer thin films.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If traditional direct poling or plasma poling methods are used, then the polymer thin film can be polarized, but the process is slow and can only handle one film at a time

Engineering Contradiction:
Improvepoling speedVSAvoidnumber of films processed simultaneously
Core Design Contradiction:
ProductivityVSQuantity of substance

Solution Approach 1:

The patent divides the poling process into multiple independent plasma sources arranged in an array, where each source can independently polarize a portion of the polymer thin film. This segmentation allows parallel processing of multiple film regions simultaneously, dramatically increasing productivity from one film at a time to multiple films or large-area films processed in parallel.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent combines multiple plasma sources into a single integrated poling system that processes multiple polymer thin films simultaneously. By merging the functionality of multiple individual poling units into one apparatus, the system achieves high-throughput production while maintaining the quality of polarization for each film.

Inventive Principle:
Principle #5Merging (Combining)

2Productivity

If plasma poling is used to increase speed, then poling efficiency improves, but uniformity and damage-free processing become challenging

Engineering Contradiction:
Improvepoling efficiencyVSAvoiduniformity of polarization
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent employs multiple independent plasma sources that can be individually controlled and optimized for their specific processing zones. Each plasma source is tailored to provide uniform polarization for its designated area, and the collective array ensures overall uniformity across the entire film surface. This local quality control prevents hot spots and non-uniform polarization that would arise from a single high-power source.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent uses dynamically controllable plasma sources that can adjust their power output and processing parameters in real-time based on the specific requirements of different film regions. This dynamic control allows the system to maintain uniform polarization quality while processing large areas at high speed, preventing damage and ensuring consistent electroactive properties across the entire film.

Inventive Principle:
Principle #15Dynamics

3Area of stationary object

If large-area poling is attempted, then production capacity increases, but achieving uniform and damage-free poling becomes difficult

Engineering Contradiction:
Improveprocessing areaVSAvoiddamage-free processing
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The patent segments the large-area processing task into multiple smaller zones, each handled by an individual plasma source. This segmentation allows each source to operate within its optimal power and density range, preventing excessive energy concentration that could cause film damage. The modular array configuration enables scalable processing of arbitrarily large areas while maintaining uniform quality and avoiding defects.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly increases the production efficiency of polarized polymer thin films by enabling faster, more uniform, and higher-yield poling processes, allowing for the creation of small-sized polarized films and improving the electroactive properties of materials used in various devices.

Implementation Method 1

the electric field is induced by a layer of dense electric charge which is dynamically formed by like charged species (e.g., electrons, negative ions) out of a plasma that is generated by ionized gas inside a closed chamber

Methodology Applied
Scientific EffectPlasma: Plasma

Implementation Method 2

a fairly strong electric field is established, for instance, perpendicular to the surfaces of the thin film

Methodology Applied
Scientific EffectElectric Field: Electric Field

Implementation Method 3

The electric field may be created by applying high voltages across conductive electrodes deposited on the two opposite surfaces of the thin film

Methodology Applied
Scientific EffectElectric Field: Electric Field

Implementation Method 4

conductive electrodes deposited on the two opposite surfaces of the thin film

Methodology Applied
Scientific EffectConduction (electrical): Conduction (electrical)

Data Source

PatentUS11830748B2Method and apparatus for poling polymer thin films
Publication Date: 2023.11.28 CREESENSE MICROSYSTEMS INC
  • US11830748B2 patent drawing
  • US11830748B2 patent drawing
  • US11830748B2 patent drawing

AI summary

A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.