Plasma Processing Apparatus Power Supply Segmentation
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Solution Overview
Problem
In plasma processing apparatuses, variations in circuit constants and electrode characteristics lead to fluctuations in high frequency power, affecting plasma generation reproducibility, bias potential, and sample processing outcomes, resulting in inconsistent processing results and reduced yield.
Innovation Solution
A plasma processing apparatus with a sample table featuring dielectric film-shaped electrodes and a coiled power supply path with a capacitor bypass line to manage high frequency power, reducing interference and stabilizing plasma generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If high frequency power is supplied to electrodes for plasma generation and bias potential control, then plasma processing capability is improved, but variations in circuit constants and electrode characteristics cause fluctuations in power distribution, reducing processing reproducibility
Solution Approach 1:
The patent divides the power supply system into separate independent circuits for plasma generation and bias potential control. Each circuit has its own dedicated power supply and control mechanism, preventing power fluctuations in one circuit from affecting the other. This segmentation isolates the variables, allowing each to be optimized independently while maintaining overall system stability and reproducibility.
Solution Approach 2:
The patent introduces an intermediary impedance matching circuit between the power supply and the electrodes. This intermediary component acts as a buffer that compensates for variations in circuit constants and electrode characteristics, ensuring stable power delivery despite changes in the plasma environment or electrode conditions.
2Power
If high frequency power is supplied to the sample table electrode for ion attraction and bias potential control, then etching capability is improved, but power fluctuations affect both plasma generation and temperature control, reducing process consistency
Solution Approach 1:
The patent separates the power control for ion attraction from the plasma generation power supply. The sample table electrode is controlled by a dedicated bias power supply operating at a different frequency and amplitude than the plasma generation system. This segmentation allows independent optimization of etching capability while maintaining plasma stability and temperature control consistency.
Solution Approach 2:
The patent employs parameter changes by using different frequency ranges for plasma generation versus bias potential control. The plasma generation uses higher frequency power while the bias control uses lower frequency power, allowing each function to operate in its optimal parameter range without interfering with the other, thereby improving etching uniformity and process consistency.
3Adaptability or versatility
If complex power supply circuits are used to control plasma generation and bias potential, then processing capability is improved, but circuit complexity increases, making the system more sensitive to component variations
Solution Approach 1:
The patent simplifies the overall system by segmenting the power supply into distinct functional blocks with dedicated control circuits. Each block handles a specific function (plasma generation, bias control, temperature management) with minimal interdependence. This modular segmentation reduces the complexity of the total circuit while maintaining versatile processing control capability through independent adjustment of each segment.
Solution Approach 2:
The patent designs the power supply system with universal control mechanisms that can handle multiple functions through standardized interfaces. The segmented architecture allows each power supply unit to serve its primary function while also contributing to overall system control, reducing the need for additional complex circuitry and minimizing sensitivity to component variations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively restrains high frequency power fluctuations, enhancing reproducibility and yield by minimizing machine differences and maintaining consistent plasma generation and temperature control.
Implementation Method 1
a bypass line which connects the two power supply lines between the coiled portion and the two electrodes and has a capacitor
Implementation Method 2
a coiled portion in which two power supply lines, which are disposed on a power supply path between the two electrodes and each power supply and connected to each of the two electrodes, are wound in parallel around the same axis
Implementation Method 3
processes the sample while electrostatically attracting and holding a sample onto an upper surface of the sample table
Implementation Method 4
an electric field or a magnetic field is supplied into the processing chamber to excite atoms or molecules of the gas to form the plasma
Data Source
AI summary
A plasma processing apparatus with improved yield, adapted to include a vacuum container, a processing chamber disposed inside thereof, and in which a plasma is formed, a sample table disposed in the processing chamber and on which a sample is placed, two electrodes which have a film shape, disposed within the sample table, and to which power for attracting the sample is supplied so that different polarities are formed, a coiled portion in which two power supply lines are wound in parallel around the same axis, and a bypass line which connects the two power supply lines between the coiled portion and the two electrodes and has a capacitor.