Plasma Processing Apparatus with Dynamic Electrode Distance Control
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Solution Overview
Problem
In organic light emitting display devices, non-uniform plasma processing of the pixel electrode surface leads to inconsistent brightness and shortened device lifetime due to lack of plasma uniformity in existing plasma-processing apparatuses.
Innovation Solution
A substrate plasma-processing apparatus with a chamber, a first electrode, a second electrode, and a distance adjusting unit that supports and moves the substrate to maintain consistent distances between the electrodes and the substrate, ensuring uniform plasma processing by adjusting the positions of the electrodes relative to the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the substrate is processed using a conventional plasma-processing apparatus with fixed electrodes, then the device structure is simple, but the plasma uniformity is poor leading to non-uniform etching
Solution Approach 1:
The patent implements a distance adjusting unit that enables dynamic adjustment of the distance between the substrate and electrodes during plasma processing. This dynamic positioning system allows optimization of plasma uniformity by varying the electrode-substrate distance, directly resolving the contradiction between achieving high plasma uniformity and maintaining simple apparatus structure.
Solution Approach 2:
The apparatus is divided into distinct functional modules: a substrate supporting unit, a distance adjusting unit with actuators, and electrode units. This segmentation allows independent optimization of each component's function, enabling precise control over plasma processing while maintaining clear structural organization.
2Manufacturing precision
If the distance between electrodes and substrate is fixed, then the apparatus operation is simple, but the etching uniformity across the substrate surface is poor
Solution Approach 1:
The distance adjusting unit with actuators enables dynamic adjustment of electrode-substrate distances during operation. This allows the system to optimize etching uniformity by adapting the distance configuration, while the automated control minimizes the increase in operational complexity through programmed sequences.
Solution Approach 2:
The patent changes the physical parameter of electrode-substrate distance during the plasma processing operation. By varying this distance parameter, the system optimizes plasma distribution and etching uniformity across the substrate surface, transforming a static parameter into a controllable variable for improved precision.
3Reliability
If the substrate surface is not uniformly plasma-processed, then the processing time is reduced, but the brightness uniformity and device lifetime are degraded
Solution Approach 1:
The dynamic distance adjustment capability allows the system to optimize plasma uniformity during processing, ensuring consistent etching quality that directly improves device lifetime and brightness uniformity. This dynamic optimization enables achieving high reliability without requiring multiple processing steps that would reduce productivity.
Solution Approach 2:
The system incorporates monitoring and control mechanisms that adjust the electrode-substrate distance based on plasma processing conditions. This feedback control ensures uniform plasma distribution across the substrate, simultaneously improving device reliability and maintaining processing efficiency by preventing rework.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves uniform etching of the substrate surface, enhancing the brightness and extending the lifetime of organic light emitting display devices by maintaining plasma uniformity, thereby solving issues of brightness degradation and reduced lifespan.
Implementation Method 1
a substrate plasma-processing apparatus for plasma-processing the surface of a pixel or other display electrode
Data Source
AI summary
A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate.