Plasma Processing Apparatus Inert Gas Purging Shower Plate Protection
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Solution Overview
Problem
Plasma processing apparatuses face issues during purging operations due to excessive pressure differences, which can damage fragile components, and insufficient inert gas supply leads to residual processing gas remaining within the reactor, causing corrosion.
Innovation Solution
A plasma processing apparatus with an inert gas feed port on the side wall and a supply path that introduces inert gas through through-holes in a plate member, ensuring efficient purging and preventing component damage by managing pressure differences and removing residual processing gas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If inert gas is supplied through the processing gas supply pipe to purge the processing chamber, then the processing chamber can be purged of processing gas, but excessive pressure difference occurs across the shower plate causing potential damage to the fragile component
Solution Approach 1:
The purging function is segmented into two independent paths: one through the processing gas supply pipe for purging the processing chamber, and another through the inert gas supply pipe that bypasses the shower plate for purging the supply path. This segmentation allows each path to perform its specific purging function without subjecting the shower plate to excessive pressure differences.
Solution Approach 2:
The inert gas supply pipe acts as an intermediary path that introduces inert gas into the processing chamber from the side wall, providing an alternative route that does not pass through the shower plate. This intermediary path enables purging of the supply path without creating damaging pressure differences across the shower plate.
2Strength
If inert gas is supplied through the side wall of the vacuum reactor to prevent shower plate damage, then the shower plate is protected from excessive pressure difference, but the processing gas supply path is insufficiently purged allowing residual processing gas to remain
Solution Approach 1:
The purging function is segmented into two independent paths: one through the processing gas supply pipe for purging the processing chamber, and another through the inert gas supply pipe that bypasses the shower plate for purging the supply path. This segmentation allows each path to perform its specific purging function without subjecting the shower plate to excessive pressure differences.
Solution Approach 2:
The inert gas supply system is designed to perform multiple functions: it can supply inert gas to the processing chamber through the side wall to protect the shower plate, and simultaneously supply inert gas to the processing gas supply path through the branched connection to purge residual processing gas from the supply path.
3Strength
If the processing gas supply path is not sufficiently purged, then the shower plate and processing chamber can be protected, but residual processing gas remains in the supply path causing corrosion when the chamber is opened to atmosphere
Solution Approach 1:
The inert gas is supplied to the processing gas supply path before the processing chamber is opened to atmosphere, in advance purging the supply path of residual processing gas. This preliminary purging action prevents corrosion by ensuring that no reactive processing gas remains in the supply path when the chamber is opened to atmospheric conditions.
Solution Approach 2:
The inert gas supply is maintained continuously through the processing gas supply path during the purging process, ensuring that the supply path is completely displaced of processing gas. This continuous action ensures thorough purging and prevents any residual processing gas from causing corrosion when the chamber is opened.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents component damage from pressure differences and ensures complete removal of processing gas, preventing corrosion by effectively raising the reactor pressure to atmospheric levels and displacing residual gases.
Implementation Method 1
supplying processing gas into a processing chamber arranged within a vacuum reactor and generating plasma so as to process wafers placed in the processing chamber
Implementation Method 2
supplying inert gas into the vacuum reactor and purging the interior thereof... inert gas is supplied into an airtightly sealed reactor maintained in vacuum so as to displace the interior of the reactor with inert gas
Data Source
AI summary
The invention provides a plasma processing apparatus and a method for purging the apparatus, capable of preventing damage of components caused by pressure difference during purging operation of a vacuum reactor, and capable of preventing residual processing gas from remaining in the vacuum reactor. Inert gas is introduced through an inert gas feed port 233 on a side wall of a depressurized processing chamber (V1) 226 of a plasma processing apparatus, and the interior of the processing chamber (V1) 226 is brought to predetermined pressure by the inert gas, and thereafter, the inert gas is supplied to processing gas supply paths 213 and 216 (V2) communicated to a plurality of through holes 224 for introducing processing gas, so as to introduce the inert gas through the plurality of through holes 224 into the processing chamber (V1) 226.