Plasma Reactor Ground Electrode Design for Hazardous Material Decomposition
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Solution Overview
Problem
Existing plasma reactors face challenges in efficiently decomposing hazardous materials in vacuum pumps due to precursor deposition on insulators, fluorine radical etching, and low decomposition rates, with conventional methods requiring water vapor and complex systems.
Innovation Solution
A plasma reactor design featuring a ground electrode, insulator, and driving electrode configuration that generates low-pressure plasma without water vapor, using separate injection holes for oxygen and hydrogen reaction gases to control dissociation times and prevent precursor deposition on insulators, enhancing decomposition rates and system simplicity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If hazardous materials flow through the inside of the plasma reactor, then decomposition of hazardous materials is achieved, but precursor decomposed by plasma is deposited on insulator surface causing thickness increase and decrease in decomposition rate
Solution Approach 1:
The patent extracts the harmful interaction between process gas and insulator by providing a ground electrode that separates the process gas flow path from the insulator surface. The ground electrode is positioned between the process gas and insulator, preventing precursor deposition on the insulator while maintaining plasma decomposition functionality.
Solution Approach 2:
The ground electrode acts as an intermediary element between the process gas and the insulator. It mediates the interaction by providing a protective barrier that prevents direct contact between decomposed precursors and the insulator surface, thereby preventing thickness increase and maintaining decomposition rate.
2Productivity
If hazardous materials flow through the inside of the plasma reactor, then decomposition is achieved, but fluorine radicals etch the insulator surface causing insulation breakdown
Solution Approach 1:
The patent extracts fluorine radicals from the process gas stream before they can reach and etch the insulator surface. The ground electrode is positioned to intercept and remove fluorine radicals, preventing them from contacting the insulator and causing insulation breakdown.
Solution Approach 2:
The ground electrode performs preliminary anti-action by removing harmful fluorine radicals from the process gas before they can etch the insulator surface. This preventive measure protects the insulator integrity while maintaining the decomposition process.
3Reliability
If water vapor is input to the front part of the plasma reactor, then oxygen and hydrogen radicals are generated for stabilizing greenhouse gases, but decomposition rate is low and amounts of oxygen and hydrogen cannot be individually controlled
Solution Approach 1:
The patent segments the reaction gas input system into separate channels for oxygen and hydrogen. This allows independent control of oxygen and hydrogen amounts, enabling optimized decomposition rates while maintaining process safety through separate injection holes.
Solution Approach 2:
The patent changes the physical state of reaction gases from vapor phase (water vapor) to gas phase (molecular oxygen and hydrogen). This parameter change enables individual control of oxygen and hydrogen amounts while improving decomposition rate and maintaining process safety.
4Reliability
If water vapor input method is used, then process safety is ensured, but additional equipment such as bubbler is required making the system complex
Solution Approach 1:
The patent extracts the bubbler equipment from the system by directly injecting gaseous oxygen and hydrogen through injection holes. This eliminates the need for water vapor generation equipment while maintaining process safety through direct gas phase injection.
Solution Approach 2:
The patent uses gaseous oxygen and hydrogen as intermediary substances instead of water vapor. This substitution eliminates the need for bubblers and complex vapor generation systems while maintaining the beneficial effects of oxygen and hydrogen radicals for process safety.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design increases the durability and decomposition rate of hazardous materials by preventing precursor deposition and fluorine radical etching, while ensuring process safety and reducing system complexity by eliminating the need for additional equipment like bubblers.
Implementation Method 1
low pressure plasma is generated inside of the first ground electrode due to a voltage difference from the ground electrode part
Implementation Method 2
decompose or remove various hazardous materials discharged in a process chamber
Data Source
AI summary
A plasma reactor for abating hazardous materials by decomposing various hazardous materials in a front end part of a vacuum pump is provided. A plasma reactor for abating hazardous materials includes a ground electrode part, an insulator, and a driving electrode. The ground electrode part includes a first ground electrode located in a front end part of the vacuum pump and having a tubular shape, including a first end part facing the vacuum pump and a second end part at an opposite side thereof, and a second ground electrode connected to a side of the first ground electrode and having a tubular shape and transferring the process gas. The insulator is connectedly installed to the second end part. The driving electrode is fixed to an outer surface of the insulator, a driving voltage is applied while being connected to a power supply, and low pressure plasma is generated inside of the first ground electrode due to a voltage difference from the ground electrode part.