Two-Stage Plasma Reactor Cascade for Stable Vortex Gas Mixing
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Solution Overview
Problem
Existing plasma reactors suffer from deposition of solid particles on reactor walls and windows due to unfavorable gas flow conditions, leading to overheating and inefficient mixing of gas streams, which hinders the formation of a homogeneous reaction mixture and stable plasma.
Innovation Solution
A two-stage reactor cascade system with tangential gas feeding and vortex flow generation in each stage, where gases are mixed before plasma formation, and electromagnetic waves are used to energize the mixture, preventing deposition and ensuring homogeneous mixing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If gas streams are mixed after plasma formation, then plasma stability is maintained, but mixing efficiency deteriorates due to density and viscosity differences
Solution Approach 1:
The patent applies preliminary action by mixing the first and second input gases in the first reactor before plasma formation occurs. The gases are combined in the desired proportions and then introduced into the plasma field, ensuring homogeneous mixing before the density and viscosity changes that would otherwise hinder effective mixing after plasma formation.
2Reliability
If quartz tube is used to bound plasma, then plasma containment is achieved, but solid particle deposition causes overheating and tube destruction
Solution Approach 1:
The patent extracts the problematic quartz tube boundary and replaces it with an open reactor design where plasma is generated directly in the reaction chamber. By removing the quartz tube constraint, solid particles can be easily removed from the reaction zone without causing overheating or deposition issues on tube surfaces.
Solution Approach 2:
The patent introduces a vortex flow field as an intermediary mechanism to control plasma behavior and particle movement. The rotational flow pattern prevents solid particles from depositing on reactor surfaces while maintaining effective plasma containment through hydrodynamic control rather than physical barriers.
3Adaptability or versatility
If electromagnetic waves are used for plasma induction, then nonthermal plasma is formed, but solid particles absorb waves causing tube overheating
Solution Approach 1:
The patent converts the harmful effect of solid particle absorption into a beneficial separation mechanism. By allowing particles to be drawn into the vortex flow core, they are concentrated in a specific region where they can be easily removed, while the electromagnetic waves continue to effectively generate and sustain the nonthermal plasma in the gas phase.
4Temperature
If separate gas streams are fed into reactor, then individual temperature control is possible, but homogeneous mixing is hindered
Solution Approach 1:
The patent applies preliminary action by pre-mixing the first and second input gases in the first reactor before they are subjected to plasma treatment in the second reactor. This ensures that temperature control can be applied to the already-mixed composition, achieving both individual temperature management and homogeneous mixing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively prevents solid deposition, stabilizes plasma, and achieves efficient mixing and reaction continuation, allowing for controlled chemical reactions with reduced energy consumption and improved reaction efficiency.
Implementation Method 1
a source (210) for generation of electromagnetic waves (211)
Implementation Method 2
nonthermal plasma, which is characterized in that only the electrons of the gas attain a very high energetic state
Implementation Method 3
Electromagnetic waves are frequently used for induction of a nonthermal plasma
Implementation Method 4
A two-stage reactor cascade system with tangential gas feeding and vortex flow generation in each stage
Data Source
AI summary
The invention relates to a device (4) for carrying out a chemical rection in a plasma (223), wherein the device (4) comprises a source for generating electromagnetic waves (211), at least one first reactor (200), at least one connecting piece (230) and a second reactor (240). The invention also relates to a method for carrying out the chemical reaction using the device (4).


