Plasma Recipe Adjustment for Component Deterioration Tolerance

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Solution Overview

Problem

Plasma processing systems face difficulties in maintaining optimal conditions when components deteriorate, leading to adverse events like abnormal discharge, requiring frequent shutdowns for maintenance.

Innovation Solution

A plasma processing system with a tolerance determination unit and recipe modification unit that adjusts plasma processing conditions based on component deterioration, allowing continuous processing by modifying set values within predetermined tolerances.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the plasma processing apparatus operates with deteriorated components, then productivity is maintained, but processing reliability deteriorates due to abnormal discharge and adverse events

Engineering Contradiction:
Improvecontinuous processing capabilityVSAvoidprocessing stability
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent implements dynamic adjustment of plasma processing conditions based on real-time component deterioration status. The control unit modifies recipe parameters (power, pressure, gas flow) dynamically to adapt to component aging, allowing continuous operation while maintaining processing stability within safe operating envelopes.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system changes physical parameters of the plasma processing environment (RF power level, chamber pressure, gas composition) in response to component deterioration. By adjusting these parameters within predetermined tolerances, the system compensates for component aging effects and prevents abnormal discharge, enabling continuous reliable operation.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If the plasma processing apparatus shuts down for maintenance, then processing reliability is improved, but productivity deteriorates due to production interruption

Engineering Contradiction:
Improveprocessing stabilityVSAvoidproduction continuity
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent enables continuous plasma processing by implementing real-time monitoring and dynamic adjustment of operating conditions. Instead of shutting down for maintenance, the system continuously adapts recipes to component deterioration, eliminating production interruptions while maintaining processing reliability through automated control.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The system performs self-adjustment of processing parameters based on monitored component status. The control unit automatically modifies recipes within predetermined tolerances without external intervention, allowing the apparatus to compensate for its own component aging and continue operation without maintenance shutdowns.

Inventive Principle:
Principle #25Self-service

3Manufacturing precision

If the plasma processing conditions are strictly maintained, then processing quality is improved, but adaptability deteriorates when components deteriorate

Engineering Contradiction:
Improveprocessing condition controlVSAvoidflexibility to component deterioration
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The system transitions from static fixed recipes to dynamic adaptive recipes that automatically adjust to component deterioration. The control unit modifies processing parameters within predetermined tolerances based on real-time component status, maintaining manufacturing precision while adapting to changing component conditions without manual intervention.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent implements flexible parameter adjustment within predetermined tolerance ranges. When component deterioration is detected, the system changes power, pressure, or gas flow parameters to compensate, maintaining processing quality while adapting to component aging. This creates a balance between strict control and necessary flexibility.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS12009190B2Plasma processing system and plasma processing method
Publication Date: 2024.06.11 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
  • US12009190B2 patent drawing
  • US12009190B2 patent drawing
  • US12009190B2 patent drawing

AI summary

A disclosed plasma processing system 10 includes: a plasma processing apparatus 100 including a processing chamber 100a for plasma processing an object 400 to be processed, and at least one component 122, 131 which is at least partially disposed in the processing chamber 100a; a storage unit 301 for storing a recipe including a set value specifying a plasma processing condition; a tolerance determination unit 302 that determines a tolerance of the set value, based on a degree of deterioration of the at least one component 122, 131; and a recipe modification unit 303 that modifies the recipe such that the set value falls within the tolerance, when the set value is outside the tolerance.