Plasma Processing Recipe Timing for Stage Temperature Stabilization
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Solution Overview
Problem
In plasma processing, the temperature of the stage on which a substrate is mounted tends to overshoot significantly after the application of radio-frequency power, leading to a prolonged stabilization time.
Innovation Solution
A recipe updating method is implemented, where a first recipe is modified to a second recipe by adjusting the application timing of the radio-frequency power based on measured reference timings and temperature maxima, thereby reducing temperature overshoot and stabilizing time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If radio-frequency power is applied to generate plasma on the substrate, then plasma processing is achieved, but the temperature of the stage overshoots significantly and stabilization time is prolonged
Solution Approach 1:
The patent applies preliminary action by cooling the stage to a temperature lower than the target temperature before applying radio-frequency power. This pre-cooling measure compensates for the expected temperature rise during plasma generation, preventing temperature overshoot and reducing stabilization time. The stage is cooled in advance based on predicted temperature increase from plasma processing, ensuring the stage reaches the target temperature faster after processing.
Solution Approach 2:
The patent implements feedback control by measuring the actual temperature of the stage during plasma processing and using this information to adjust subsequent cooling or heating actions. The temperature measurement feedback allows the system to dynamically control the stage temperature, preventing overshoot and achieving faster stabilization. The control unit adjusts the cooling or heating based on the measured temperature to maintain accurate temperature control.
2Temperature
If the application timing of radio-frequency power is adjusted to optimize temperature control, then temperature overshoot is reduced, but additional measurement and calculation steps are required
Solution Approach 1:
The patent applies self-service by enabling the system to automatically update its own processing recipes based on measured temperature data. The control unit automatically calculates optimal application timing and updates the recipe without requiring external intervention or complex manual adjustments. This self-updating mechanism reduces the burden on operators and simplifies the overall process despite the added measurement and calculation steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively suppresses temperature overshoot and shortens the stabilization time of the stage temperature after radio-frequency power application, improving processing efficiency.
Implementation Method 1
a plasma processing is performed on a substrate mounted on a stage by applying a radio-frequency power to the stage on which the substrate such as a semiconductor wafer is mounted to generate plasma
Data Source
AI summary
A recipe updating method of a plasma processing apparatus includes: performing a plasma processing on a substrate mounted on a stage using a first recipe including an application timing of a radio-frequency power for plasma generation; measuring a reference timing at which a temperature of the stage drops to a minimum value and a first maximum value of the temperature of the stage in association with the first recipe; performing the plasma processing on the substrate using a second recipe obtained by changing the application timing of the first recipe to the reference timing; measuring a second maximum value of the temperature of the stage in association with the second recipe; and updating the first recipe to the second recipe when the second maximum value is smaller than the first maximum value.