Plasma Resonator Layout for Harmonic Suppression and RF Matching

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Solution Overview

Problem

Existing plasma processing apparatuses face challenges in efficiently suppressing harmonic waves and radio-frequency power loss due to impedance mismatches between the resonator and the radio-frequency supply line, leading to abnormal oscillations and power reflection.

Innovation Solution

The apparatus incorporates a resonator design with a power feeder positioned closer to the first end, a waveguide structure with specific impedance matching, and capacitors or a circulator/isolator to minimize harmonic wave reflection and power loss, utilizing a coaxial line with capacitors or a coupler with variable impedance for improved impedance matching.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If the power feeder is positioned at the conventional distance from the first end of the resonator, then the impedance matching is achieved, but harmonic waves are reflected and radio-frequency power is lost

Engineering Contradiction:

Improveradio-frequency power lossVSAvoidresonator structure complexity

Core Design Contradiction:

Loss of energyVSDevice complexity

Solution Approach 1:

The patent changes the positional parameter of the power feeder within the resonator, specifically positioning it closer to the first end than conventional designs. This parameter change optimizes the electrical characteristics to reduce impedance mismatch and minimize radio-frequency power loss while suppressing harmonic wave reflection

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent converts the potentially harmful harmonic waves and impedance mismatches into beneficial effects by strategically positioning the power feeder to exploit resonant conditions that suppress harmonics and improve power transfer efficiency, turning what would be loss mechanisms into performance-enhancing features

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

2Reliability

If the power feeder is positioned closer to the first end of the resonator, then harmonic wave reflection is suppressed and power loss is reduced, but the impedance matching becomes more difficult to achieve

Engineering Contradiction:

Improveplasma generation stabilityVSAvoidimpedance matching implementation

Core Design Contradiction:

ReliabilityVSEase of manufacture

Solution Approach 1:

The patent modifies the electrical parameter configuration by adjusting the power feeder position to create favorable impedance conditions. This positional parameter change naturally improves impedance matching, making the system more reliable for stable plasma generation while actually simplifying rather than complicating the manufacturing process

Inventive Principle:

Principle #35Parameter changes

3Productivity

If conventional resonator design is used, then the structure is simple, but abnormal oscillations occur and power reflection increases

Engineering Contradiction:

Improveplasma processing efficiencyVSAvoidabnormal oscillations and power reflection

Core Design Contradiction:

ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent changes the critical parameter of power feeder positioning to optimize the resonant characteristics of the system. This parameter modification suppresses abnormal oscillations and reduces power reflection, thereby improving plasma processing efficiency by eliminating harmful interference patterns that would otherwise reduce productivity

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design effectively suppresses harmonic wave reflection, reduces radio-frequency power loss, and stabilizes the plasma generation process by minimizing abnormal oscillations and power reflection, enhancing the efficiency and stability of the plasma processing.

Implementation Method 1

a waveguide extending between the first end and the second end, which are configured to resonate the electromagnetic waves therebetween

Methodology Applied

Scientific EffectResonance: Resonance

Implementation Method 2

the waveguide extending between the first end and the second end, which are configured to resonate the electromagnetic waves therebetween, and is electromagnetically coupled to the introducer

Methodology Applied

Scientific EffectElectromagnetic coupling: Electromagnetic Induction

Data Source

PatentUS20260058097A1Plasma processing apparatus

Publication Date: 2026.02.26 TOKYO ELECTRON LTD

AI summary

A plasma processing apparatus includes: a chamber; an introducer disposed to introduce electromagnetic waves into a plasma generation region in the chamber; a radio-frequency power source; a radio-frequency supply line electrically connected to the radio-frequency power source; and a resonator including a power feeder which is an entrance of electromagnetic waves and is connected to the radio-frequency supply line, first and second ends resonating the electromagnetic waves therebetween, and a waveguide extending between the first and second ends to be electromagnetically coupled to the introducer, wherein a distance between the power feeder and the first end along a propagation direction of the electromagnetic waves is shorter than a distance along the propagation direction between the first end and a position in the resonator at which, during plasma excitation, an impedance obtained when viewing a load side from the position becomes equal to characteristic impedance of the radio-frequency supply line.