Plasma Resonator Waveguide Layout for Uniform RF Plasma Generation
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in efficiently generating and maintaining uniform plasma due to suboptimal resonance of electromagnetic waves, leading to inefficiencies in substrate processing.
Innovation Solution
The plasma processing apparatus incorporates a resonator with a first and second short-circuiting portion that electromagnetically couple to promote resonance, featuring a dielectric second short-circuiting portion with specific capacitance and a meandering waveguide path to enhance electromagnetic wave resonance, coupled with a radio-frequency power supply for variable frequency control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a conventional waveguide is used to supply electromagnetic waves to the emitter, then the structure is simple, but the resonance of electromagnetic waves is suboptimal leading to inefficient plasma generation
Solution Approach 1:
The waveguide is segmented into multiple sections including a resonator portion with multiple reflectors and a waveguide path with meandering configuration. This segmentation allows electromagnetic waves to resonate efficiently through multiple reflections while maintaining a manageable structural complexity through modular design elements.
Solution Approach 2:
The waveguide path is configured to meander rather than follow a straight line, creating curved paths for electromagnetic wave propagation. This meandering configuration increases the interaction path length and resonance efficiency without requiring a proportionally larger overall structure, thus improving plasma generation efficiency while controlling structural complexity.
2Reliability
If the resonator has a long waveguide path to enhance resonance, then the resonance efficiency improves, but the device size increases
Solution Approach 1:
The resonator structure nests multiple functional elements within a compact volume, including multiple reflectors positioned at specific intervals along the waveguide path. The meandering waveguide path is nested within the resonator housing, allowing a long effective resonance path to be achieved within a reduced overall device volume by utilizing three-dimensional space efficiently.
Solution Approach 2:
The waveguide path transitions from a simple linear configuration to a meandering three-dimensional path that utilizes vertical and lateral dimensions. This dimensional transformation allows the electromagnetic waves to traverse a longer effective path length for enhanced resonance while the physical footprint and volume of the resonator remain constrained through compact spatial arrangement.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design promotes efficient and uniform plasma generation, enhancing processing efficiency by ensuring consistent electromagnetic wave resonance and improved substrate treatment.
Implementation Method 1
The resonator includes a first short-circuiting portion constituting a first end of the waveguide path of the resonator and a second short-circuiting portion constituting a second end of the waveguide path of the resonator. The second end of the waveguide path of the resonator is electromagnetically coupled to the emitter. The second short-circuiting portion has a capacitance that short-circuits the waveguide path at a frequency of the electromagnetic waves.
Implementation Method 2
A plasma processing apparatus is used in processing a substrate. A type of the plasma processing apparatus, in which a gas is excited using radio frequency waves such as VHF waves or UHF waves, is known.
Data Source
AI summary
A plasma processing apparatus includes: a chamber having a processing space therein; a substrate support provided inside the processing space; an upper electrode provided above the substrate support with the processing space interposed therebetween; an emitter provided to emit electromagnetic waves into a plasma generation space and extending in a circumferential direction around a central axis of the chamber and the processing space; and a waveguide configured to supply the electromagnetic waves to the emitter; wherein the waveguide includes a resonator having a waveguide path therein, wherein the resonator includes a first short-circuiting portion constituting a first end of the waveguide path and a second short-circuiting portion constituting a second end of the waveguide path, wherein the second end of the waveguide path is electromagnetically coupled to the emitter, and wherein the second short-circuiting portion has a capacitance that short-circuits the waveguide path at a frequency of the electromagnetic waves.