Plasma Processing RF Power Extraction for Voltage Measurement
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Solution Overview
Problem
The existing plasma processing techniques struggle to determine the process state of substrate processing when multiple radio-frequency powers with different frequencies are superposed, as the peak-to-peak voltages become mixed, making it difficult to use them as an index for process determination.
Innovation Solution
A plasma processing apparatus and method that utilize a common feeding line to supply radio-frequency powers with different frequencies to an electrode, featuring a radio-frequency power extracting device and detector to measure and correct voltages, allowing for the use of peak-to-peak voltage as an index for process determination, even when powers with different frequencies are superposed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple radio-frequency powers with different frequencies are superposed and supplied to an electrode, then plasma processing uniformity is improved, but the ability to determine process state using peak-to-peak voltage is deteriorated
Solution Approach 1:
The patent segments the superposed radio-frequency power into individual frequency components using a frequency separator. The frequency separator divides the composite RF power into separate frequency bands, allowing independent measurement of each component's peak-to-peak voltage. This enables accurate process state determination while maintaining the benefits of superposed RF powers for plasma uniformity.
Solution Approach 2:
The patent introduces a frequency separator as an intermediary device between the RF power supply and the electrode. This intermediary separates the mixed frequency signals before they reach the electrode, enabling individual voltage measurements of each frequency component while still allowing all frequencies to be applied to the plasma for uniform processing.
2Measurement precision
If a single frequency radio-frequency power is supplied to an electrode, then process state determination is simplified, but plasma processing uniformity is reduced
Solution Approach 1:
The patent merges multiple radio-frequency power sources with different frequencies into a single superposed RF power signal that is supplied to the electrode. This combination maintains plasma processing uniformity through multi-frequency excitation while the frequency separator simultaneously enables individual component measurement for accurate process state determination.
Solution Approach 2:
The frequency separator acts as an intermediary that separates the merged RF power components for measurement purposes without interfering with their combined application to the plasma. This allows the system to enjoy both the uniformity benefits of multi-frequency superposition and the measurement simplicity of single-frequency analysis.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables stable operation of the plasma processing apparatus by accurately determining the process state through the behavior of peak-to-peak voltage, even with superposed radio-frequency powers, thereby improving process control and stability.
Implementation Method 1
a radio-frequency power for exciting a processing gas into plasma is supplied to the upper electrode
Implementation Method 2
plasma is generated by supplying a radio-frequency power to one or both of the electrodes
Data Source
AI summary
A plasma processing apparatus includes a plurality of radio-frequency power supplies for supplying radio-frequency powers having frequencies different from each other, a common feeding line for superposing radio-frequency powers supplied respectively from the plurality of radio-frequency power supplies and feeding the superposed radio-frequency power to a same radio-frequency electrode, a radio-frequency power extracting device for extracting radio-frequency powers having predetermined frequencies from radio-frequency powers fed via the feeding line, and a radio-frequency voltage detector for measuring voltages of the radio-frequency powers having the predetermined frequencies extracted by the radio-frequency power extracting device.