Plasma Confinement Screen Layout for Uniform Substrate Processing

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Solution Overview

Problem

Existing plasma screens are ineffective in confining plasma in both vertical and radial directions during substrate processing, leading to non-uniform process results and inefficient energy use.

Innovation Solution

A plasma confinement screen system comprising an inner and outer annular plasma screen with adjustable vertical movement, allowing for enhanced vertical and radial control of the plasma cloud.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stability of the object's composition

If a single plasma screen is used to confine plasma, then vertical confinement is improved, but radial confinement remains ineffective

Engineering Contradiction:
Improveplasma confinement stabilityVSAvoidprocess uniformity
Core Design Contradiction:
Stability of the object's compositionVSManufacturing precision

Solution Approach 1:

The plasma confinement system is divided into multiple independent screens (first plasma screen, second plasma screen, third plasma screen) positioned at different locations. Each screen contributes to different aspects of plasma confinement, with the inner screen providing radial confinement and the outer screen providing vertical confinement, thereby resolving the limitation of single-screen designs

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The invention transitions from single-dimension confinement to multi-dimensional confinement by adding both radial confinement (through the inner screen with holes facing the substrate) and vertical confinement (through the outer screen positioned above the substrate). This multi-dimensional approach simultaneously improves both radial and vertical plasma control

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Device complexity

If plasma is left unconfined, then device complexity is reduced, but plasma scatter increases and process uniformity deteriorates

Engineering Contradiction:
Improveconfinement structure complexityVSAvoidprocess uniformity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The plasma screens are designed with non-uniform hole distributions and different opening patterns tailored to local plasma behavior requirements. The inner screen has holes optimized for radial confinement near the substrate, while the outer screen has holes optimized for vertical confinement, creating locally optimized confinement zones throughout the processing chamber

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The system allows dynamic adjustment of plasma confinement parameters by independently controlling the position and configuration of multiple screens. Operators can modify hole opening areas, screen positions, and relative configurations to optimize plasma confinement for different process conditions and substrate types

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If plasma screens are added to confine plasma, then process uniformity is improved, but energy loss increases

Engineering Contradiction:
Improveprocess uniformityVSAvoidplasma energy loss
Core Design Contradiction:
Manufacturing precisionVSLoss of energy

Solution Approach 1:

The plasma screens are designed as porous structures with carefully controlled hole distributions rather than solid barriers. This allows plasma to pass through the screens while still providing confinement, reducing energy loss compared to solid wall configurations while maintaining effective plasma control and process uniformity

Inventive Principle:
Principle #31Porous materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Improves plasma uniformity and reduces scatter, enhancing process uniformity and energy efficiency in substrate processing.

Implementation Method 1

a plasma confinement screen system extending from the process kit. The plasma confinement screen system includes: an inner plasma screen having an inner annular body with a central opening, the annular body including a plurality of first openings; and an outer plasma screen having an outer annular body with a central opening surrounding the inner plasma screen, the outer annular body including a plurality of second openings

Methodology Applied
Scientific EffectPlasma confinement:

Data Source

PatentUS12614701B2Substrate processing chamber with plasma confinement
Publication Date: 2026.04.28 APPLIED MATERIALS INC
  • US12614701B2 patent drawing
  • US12614701B2 patent drawing
  • US12614701B2 patent drawing

AI summary

A plasma confinement screen system for a process chamber includes an inner plasma screen having an inner annular body with a central opening, the annular body including a plurality of first openings; and an outer plasma screen having an outer annular body with a central opening surrounding the inner plasma screen, the outer annular body including a plurality of second openings, wherein the outer plasma screen is configured for vertical movement relative to the inner plasma screen.