Plasma Shield Assembly With Bumper Rings for Radical Loss Control
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Solution Overview
Problem
Existing remote plasma processing systems for large-area substrates face significant losses and contamination issues due to surface reactions and recombination of radicals, leading to reduced ashing quality and process performance.
Innovation Solution
A plasma shield assembly with a guide component and a detachable shield component, featuring through holes and bumper rings made of insulating materials like Teflon, which prevents radical loss and contamination by creating a gap between components and directing radicals efficiently onto the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a diffusion plate with shower head structure is used to uniformly apply radicals to the substrate, then uniform radical distribution is improved, but radical loss due to surface reactions and recombination increases
Solution Approach 1:
The diffusion plate is segmented into multiple regions with different hole diameters and distributions. The plate includes a central region with smaller holes and peripheral regions with larger holes, allowing differentiated radical delivery to match the substrate's ashing requirements across different zones while reducing overall radical loss.
Solution Approach 2:
Different regions of the diffusion plate are designed with locally optimized characteristics - the central region has smaller holes for precise radical control, while peripheral regions have larger holes for broader coverage. This local quality differentiation maintains uniform radical application while minimizing surface reactions and recombination losses.
2Manufacturing precision
If radicals are supplied through a diffusion plate, then radical distribution is improved, but contamination of the diffusion plate surface occurs
Solution Approach 1:
The diffusion plate is designed as a detachable component that can be easily removed and replaced. When contamination occurs on the diffusion plate surface, the entire plate can be extracted from the system and replaced with a fresh one, eliminating the need for complex cleaning processes and maintaining continuous operation.
Solution Approach 2:
The diffusion plate is designed as a consumable component with a service life. After a certain period or when contamination becomes significant, the diffusion plate is discarded and replaced with a new one. This approach is more efficient than attempting to clean and reuse the plate, ensuring consistent radical distribution quality.
3Area of stationary object
If the diffusion plate is used for remote plasma processing, then process coverage is improved, but process time increases due to radical loss
Solution Approach 1:
The diffusion plate is divided into multiple zones with optimized hole patterns for different regions. The central zone has denser hole distribution for high-precision areas, while peripheral zones have sparser distribution for broader coverage areas, allowing efficient processing across the entire substrate without excessive radical loss.
Solution Approach 2:
The diffusion plate parameters (hole diameter, hole density, hole depth) are optimized to change across different regions. By adjusting these parameters locally, the system achieves both large-area coverage and minimized radical loss, reducing overall process time while maintaining comprehensive substrate treatment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The plasma shield assembly enhances process performance by minimizing radical loss and preventing surface contamination, ensuring uniform radical application and maintaining process quality.
Implementation Method 1
plasma generators that generate radicals using process gas
Implementation Method 2
bumper rings disposed adjacent to the second through holes to prevent the radicals from entering the gap
Data Source
AI summary
A plasma shield assembly may include a guide component including first through holes connected to plasma generators that generate radicals using process gas, and a shield component detachably coupled to the guide component and disposed on a lower surface of the guide component, and including second through holes aligned with the first through holes to pass the radicals from the first through holes. The shield component may be spaced apart from the lower surface of the guide component with a gap formed between the shield component and the guide component. Bumper rings disposed adjacent to the second through holes to prevent the radicals from entering the gap.