Plasma Chamber Shield Heating With External Cooling
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Solution Overview
Problem
Plasma processing apparatuses face challenges in controlling the temperature of shield members within the chamber, which is essential for preventing byproduct accumulation and maintaining efficient plasma processing.
Innovation Solution
Incorporating a heater to heat the member extending from the internal space of the chamber, allowing it to be cooled externally and maintaining temperature control, with an optional spacer increasing thermal resistance to manage temperature rises during plasma generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a shield member is provided inside the chamber to prevent byproduct accumulation, then the reliability of plasma processing is improved, but the temperature control of the member becomes difficult
Solution Approach 1:
The shield member is divided into two distinct parts: a first shield member located inside the chamber and a second shield member located outside the chamber. This segmentation allows independent temperature management for each part, with the internal portion protecting against byproducts and the external portion accessible for active cooling, thereby resolving the temperature control difficulty while maintaining byproduct prevention functionality.
Solution Approach 2:
A cooling device is introduced as an intermediary element between the second shield member and the chamber environment. This cooling device actively removes heat from the external shield member, preventing heat transfer to the internal shield member and plasma processing region. The intermediary cooling system enables temperature control of the shield member without compromising the byproduct prevention function.
2Temperature
If the member is fully contained inside the chamber, then the temperature control is simplified, but the cooling efficiency is reduced
Solution Approach 1:
The second shield member is extracted from the chamber interior and positioned in the external environment. This extraction allows the shield member to be cooled by the ambient external environment, significantly improving cooling efficiency. The dual-shield configuration ensures that the critical first shield member remains inside for byproduct prevention, while the extracted second shield member serves as a heat sink that can be efficiently cooled externally.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables precise temperature control of the member, preventing byproduct accumulation and ensuring stable plasma processing conditions by allowing external cooling and internal heating, while minimizing temperature increases within the chamber.
Implementation Method 1
a heater configured to heat the member
Implementation Method 2
The member extends outward from the internal space of the chamber and is exposed to a space outside the chamber
Data Source
AI summary
A plasma processing apparatus according to an exemplary embodiment includes a chamber, a member, and a heater. Plasma is generated in an internal space of the chamber. The member is partially located in the internal space of the chamber. The heater is configured to heat the member. The member extends outward from the internal space of the chamber and is exposed to a space outside the chamber.