Plasma Processing Shielding Member Thermal Insulation
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Solution Overview
Problem
The existing plasma processing apparatuses face challenges in suppressing the increase in temperature of the matching device and preventing high-frequency wave leakage when introducing heated processing gas into the processing container, which can lead to performance degradation or failure of the matching device.
Innovation Solution
A plasma processing apparatus configuration that includes a cylindrical shield member, a power feeding rod, a gas introduction member, and a sealing member made of conductive materials with lower thermal conductivity, where the gas introduction member and shield member are grounded to prevent heat radiation and high-frequency wave leakage, ensuring efficient plasma processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If heated processing gas is introduced into the processing container, then plasma processing efficiency is improved, but the matching device temperature increases leading to performance degradation
Solution Approach 1:
A shielding member is introduced as an intermediary component between the heated processing gas and the matching device. This shielding member blocks the direct thermal path, preventing heat from the processing gas from reaching the matching device while allowing the gas to continue its function in the processing container.
Solution Approach 2:
The internal structure of the shielding member is segmented into multiple heat radiation shielding portions arranged in a matrix pattern. This segmentation creates multiple thermal barriers that effectively block heat radiation from reaching the matching device, while maintaining structural integrity and gas flow pathways.
2Ease of operation
If gas introduction member penetrates the shield member, then gas supply path is established, but high-frequency wave leakage occurs through the penetration portion
Solution Approach 1:
The sealing member is nested within the penetration portion of the shielding member, creating a layered structure. The gas introduction member passes through the sealing member which is itself positioned within the shielding member's penetration portion. This nested arrangement ensures that the sealing member effectively seals the gap between the gas introduction member and shielding member, preventing high-frequency wave leakage while maintaining the gas supply pathway.
3Ease of manufacture
If conventional sealing materials are used at the penetration portion, then assembly is simplified, but thermal conductivity is too high causing heat transfer to matching device
Solution Approach 1:
The sealing member is made from a material with specifically controlled thermal conductivity parameters (0.05 to 0.5 W/m·K), which is lower than conventional sealing materials. This parameter change ensures that the sealing member provides effective thermal insulation while maintaining its sealing function. The material property modification directly addresses the heat transfer issue without compromising assembly simplicity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses the temperature increase of the matching device and prevents high-frequency wave leakage, maintaining the performance and integrity of the plasma processing apparatus while ensuring efficient plasma uniformity and process performance.
Implementation Method 1
a sealing member provided outside the shield member and on a peripheral edge of a penetration portion of the shield member through which the gas introduction member penetrates, the sealing member being made of a conductive material having a lower thermal conductivity than materials of the gas introduction member and the shield member
Implementation Method 2
the gas introduction member and the shield member are grounded to an earth
Implementation Method 3
the gas introduction member and the shield member are grounded to an earth
Implementation Method 4
the sealing member being made of a conductive material having a lower thermal conductivity than materials of the gas introduction member and the shield member
Data Source
AI summary
A plasma processing apparatus for performing a plasma processing on a substrate within a processing container includes: an upper electrode disposed above the processing container; a cylindrical shield member provided on the processing container to support a matching device; a power feeding rod disposed inward of the shield member and for supplying a high-frequency power provided from a plasma source to the upper electrode via the matching device; a gas introduction member for supplying a processing gas heated outside the shield member into the processing container from above the upper electrode; and a sealing member provided outside the shield member and on a peripheral edge of a penetration portion of the shield member through which the gas introduction member penetrates, the sealing member made of a conductive material having a lower thermal conductivity than materials of the gas introduction member and the shield member.