Plasma Chamber Shutter Contact Structure for Thermal Expansion

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Solution Overview

Problem

Existing plasma processing apparatuses suffer from plasma leakage due to the disconnection of electrical contact between the valve body and the baffle plate during thermal expansion, which affects plasma uniformity and chamber integrity.

Innovation Solution

A substrate processing apparatus with a shutter mechanism featuring a conductive elastic member that maintains electrical contact between the valve body and the baffle plate through a vertically inclined portion and a contact member, ensuring continuous conduction even during thermal expansion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a rigid shutter mechanism is used to close the chamber opening, then the shutter can effectively block plasma, but thermal expansion causes disconnection of electrical contact between the valve body and baffle plate leading to plasma leakage

Engineering Contradiction:

Improveplasma leakage preventionVSAvoidthermal expansion accommodation

Core Design Contradiction:

ReliabilityVSAdaptability or versatility

Solution Approach 1:

The patent employs a flexible contact member (elastic member) instead of a rigid connection between the valve body and baffle plate. This flexible member can elastically deform to accommodate thermal expansion while maintaining continuous electrical contact, preventing plasma leakage that would occur with rigid connections.

Inventive Principle:

Principle #30Flexible shells and thin films

Solution Approach 2:

The patent changes the physical state of the contact member from rigid to elastic, allowing it to dynamically adjust its deformation parameter in response to thermal expansion. This enables the system to adapt to temperature changes while maintaining electrical continuity for plasma containment.

Inventive Principle:

Principle #35Parameter changes

2Reliability

If a conductive elastic member is used to maintain electrical contact, then plasma leakage is suppressed, but the device complexity increases

Engineering Contradiction:

Improveelectrical contact continuityVSAvoidshutter mechanism structure

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

The patent introduces a conductive elastic member as an intermediary element between the valve body and baffle plate. This intermediary maintains electrical contact continuity while absorbing thermal expansion, achieving reliable plasma containment without requiring complex adjustment mechanisms.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The flexible elastic member provides a simple yet effective solution to maintain electrical contact during thermal expansion, avoiding the need for complex mechanical adjustment systems while ensuring plasma leakage prevention.

Inventive Principle:

Principle #30Flexible shells and thin films

3Adaptability or versatility

If the chamber opening is enlarged to transfer large parts, then transfer capability is improved, but plasma leakage risk increases due to larger exposure area

Engineering Contradiction:

Improvepart transfer capabilityVSAvoidplasma leakage exposure

Core Design Contradiction:

Adaptability or versatilityVSObject-affected harmful factors

Solution Approach 1:

The flexible contact member ensures continuous electrical contact between the valve body and baffle plate even when the chamber opening is enlarged. This maintains the integrity of the plasma barrier, preventing leakage that would be more likely with larger openings and greater thermal expansion.

Inventive Principle:

Principle #30Flexible shells and thin films

Solution Approach 2:

The elastic member provides a simple, replaceable solution to maintain electrical contact, offering a cost-effective way to prevent plasma leakage in enlarged chamber configurations without requiring complex sealing systems.

Inventive Principle:

Principle #27Cheap short-living objects (Disposable)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively suppresses plasma leakage by maintaining electrical connection, thereby preserving plasma uniformity and chamber integrity, even under thermal stress and corrosive conditions.

Implementation Method 1

a contact member disposed on a side surface of the substrate support and formed of a conductive elastic member

Methodology Applied

Scientific EffectElasticity: Elasticity

Implementation Method 2

a baffle plate disposed between an inner peripheral side of the chamber and the substrate support and having a vertically inclined portion at an end portion on a substrate support side

Methodology Applied

Scientific EffectPlasma flow direction control:

Data Source

PatentUS12482638B2Substrate processing apparatus and shutter

Publication Date: 2025.11.25 TOKYO ELECTRON LTD

AI summary

A substrate processing apparatus comprises a substrate support disposed in the chamber, a shutter including a valve body configured to open and close an opening of the chamber, and a baffle plate disposed between an inner peripheral side of the chamber and the substrate support and having a vertically inclined portion at an end portion on a substrate support side, and a contact member disposed on a side surface of the substrate support and formed of a conductive elastic member. In a state where the shutter is closed, contact between the end portion on the substrate support side and the contact member is maintained.