Plasma Source Ion Flux Control via Segmented Electrode Biasing
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Solution Overview
Problem
Existing plasma sources with alternating cathode and anode configurations may not generate sufficient energy levels for high-energy ion beams, limiting their effectiveness in certain applications.
Innovation Solution
A plasma source with at least two electrodes that are alternately biased as cathodes and anodes, with specific ion flush biases applied during different portions of each cycle to control and enhance the ion flux, using a combination of DC power supplies and a switching unit to manage the electrode biases and ion flux.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If electrodes are configured to operate as alternating cathodes and anodes with AC or bipolar pulse DC power supplies, then the plasma source can operate with simplified electrode configuration, but the ion flux energy levels are insufficient for high-energy applications
Solution Approach 1:
The cycle is divided into four distinct portions: first cathode/anode phase, first ion flush phase, second cathode/anode phase, and second ion flush phase. This segmentation allows independent optimization of ion generation and ion energy enhancement, resolving the contradiction between operational simplicity and high energy output
Solution Approach 2:
Ion flush phases are inserted between the cathode/anode phases to preliminarily condition the plasma and enhance ion energy before the next ion generation phase. This preliminary action ensures that ions accumulate sufficient energy during the ion flush portions while maintaining the simple alternating electrode configuration
2Use of energy by moving object
If ion flush bias is applied during specific portions of the cycle, then ion flux energy is enhanced for high-energy applications, but the control system complexity increases
Solution Approach 1:
The power supply operates in periodic cycles with four distinct portions, applying ion flush bias during the second and fourth portions while maintaining simple alternating cathode/anode configuration during the first and third portions. This periodic action achieves high ion energy through time-dependent control rather than spatial complexity
Solution Approach 2:
The electrode biases are dynamically switched between different configurations (alternating cathode/anode vs. ion flush bias) at different time portions within each cycle. This dynamic switching allows the system to adapt between ion generation mode and ion energy enhancement mode, achieving high energy output without permanent structural complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for precise control of ion flux, enabling the generation of ion beams with sufficient energy levels for high-energy applications by varying the magnitude and duration of ion flush biases, thereby improving the plasma source's performance.
Implementation Method 1
A plasma source is used to generate plasma that can be used to activate a precursor material on or near the substrate
Implementation Method 2
The plasma source is configured to, during a first portion of each cycle, bias the first electrode as a cathode and use the second electrode as an anode
Implementation Method 3
discharge an ion beam onto the substrate
Implementation Method 4
apply an ion flush bias to the first and second electrodes
Data Source
AI summary
One embodiment is directed to a plasma source comprising a cavity and at least first and second electrodes. The plasma source is configured to, during a first portion of each cycle, bias the first electrode as a cathode and use the second electrode as an anode, during a second portion of each cycle, apply an ion flush bias to the first and second electrodes, during a third portion of each cycle, bias the second electrode as a cathode and use the first electrode as an anode, and during a fourth portion of each cycle, apply an ion flush bias to the first and second electrodes. Other embodiments are disclosed.