Remote Plasma Source Gas Manifold Velocity Control
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Solution Overview
Problem
Current plasma source devices are sensitive to pressure, density, and residence time, leading to variations in plasma uniformity, which affects semiconductor and thin film applications.
Innovation Solution
A remote plasma source with a gas input manifold that imparts radial and longitudinal velocities to the gas, creating a swirling effect and promoting uniform gas distribution and residence time within the plasma chamber, thereby enhancing plasma uniformity and reducing variations in pressure and density.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If gas is introduced directly into the plasma chamber without velocity control, then the device structure is simple, but plasma uniformity deteriorates due to variations in pressure, density, and residence time
Solution Approach 1:
The gas input manifold segments the gas flow into multiple channels, each directing gas to different regions of the plasma chamber. This segmentation allows independent control of gas distribution patterns, enabling uniform plasma generation while maintaining a relatively simple overall structure.
Solution Approach 2:
The gas input manifold changes the velocity parameters of gas flow by imparting both radial and longitudinal velocity components. This parameter modification optimizes gas distribution and residence time in the plasma chamber, improving plasma uniformity without requiring complex additional components.
2Manufacturing precision
If gas flow velocity is increased to improve plasma uniformity, then plasma production is optimized, but pressure variations increase affecting plasma consistency
Solution Approach 1:
The gas input manifold creates a dynamic gas flow pattern with both radial and longitudinal velocity components. This dynamic flow pattern adapts to maintain consistent gas distribution and pressure conditions in the plasma chamber, optimizing plasma consistency while controlling pressure variations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves a more consistent and uniform plasma, minimizing hot spots and optimizing plasma production for improved semiconductor and thin film applications.
Implementation Method 1
The plurality of channels are configured to direct the gas from the gas chamber downstream to the plasma chamber and to impart a radial velocity and a longitudinal velocity on the gas as the gas passes through the plurality of channels
Implementation Method 2
A plasma source is a device which transforms a feed gas or gases into a quasi-neutral, non-thermal plasma, by means of an externally applied electric/electromagnetic field. In the process of transforming gas into plasma, the gas particles can be excited, ionized, and/or dissociated.
Data Source
AI summary
This disclosure describes a remote plasma source, a gas input manifold, and related methods of making and using. In some examples, a remote plasma source is provided with a plasma chamber, a gas input manifold, and an output region. The remote plasma source also has means for introducing a gas into the plasma chamber, the means for introducing configured to impart a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source.