Transformer-Coupled Plasma Source Layout for Lower RF Mode Transition Power

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Solution Overview

Problem

Existing plasma generator systems face challenges in efficiently transitioning from a capacitive mode to an inductive mode, requiring high RF power levels that increase wear on components and reduce system efficiency.

Innovation Solution

The design incorporates a radio frequency (RF) generator with a specific coil configuration, where the radial distance between the RF coils and the electrically conductive portion of the collar assembly is greater than or equal to 40 mm, and the use of a dielectric window transmissive to RF energy, to reduce eddy current formation and lower the power threshold for mode transition.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If high RF power levels are used to transition from capacitive mode to inductive mode, then the mode transition is achieved, but component wear increases and system efficiency decreases

Engineering Contradiction:
ImproveRF power levelVSAvoidcomponent lifespan
Core Design Contradiction:
PowerVSReliability

Solution Approach 1:

The patent modifies the geometric parameters of the plasma generation system by increasing the radial distance between the RF coil and the collar assembly to at least 40 mm. This parameter change reduces the coupling between the coil and conductive structures, thereby reducing eddy current losses and enabling mode transition at lower RF power levels, which extends component lifespan and improves reliability.

Inventive Principle:
Principle #35Parameter changes

2Power

If high RF power levels are used to transition from capacitive mode to inductive mode, then the mode transition is achieved, but system efficiency decreases

Engineering Contradiction:
ImproveRF power levelVSAvoidenergy efficiency
Core Design Contradiction:
PowerVSLoss of energy

Solution Approach 1:

The patent changes the spatial parameter of the system by increasing the radial distance between the RF coil and the collar assembly to at least 40 mm. This reduces parasitic eddy current losses in the collar assembly, thereby improving energy efficiency and reducing the RF power required for mode transition.

Inventive Principle:
Principle #35Parameter changes

3Loss of energy

If the radial distance between RF coils and collar assembly is increased to reduce eddy currents, then energy efficiency improves, but device complexity increases

Engineering Contradiction:
Improveeddy current lossVSAvoidcoil configuration complexity
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The patent applies a straightforward geometric parameter change - increasing the radial distance to at least 40 mm - which reduces eddy current losses without requiring complex coil configurations, multiple coils, or intricate structural modifications. The solution maintains simplicity while achieving the energy efficiency goal.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration reduces the RF power required to transition from capacitive to inductive mode, thereby extending the lifespan of system components, reducing maintenance costs, and improving overall plasma generation efficiency.

Implementation Method 1

a window (104) including a dielectric material that is transmissive to radio frequency (RF) energy

Methodology Applied
Scientific EffectRF energy transmission through dielectric material: Dielectric

Implementation Method 2

one or more RF coils positioned above the second side of the window, wherein, when viewed along a first axis perpendicular to the window

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 3

create a plasma that, when a process gas is flowed into them, creates neutral particles, ions, and/or radicals of the process gas

Methodology Applied
Scientific EffectIonization: Ionisation

Data Source

PatentUS20250132127A1Transformer coupled plasma source design for thin dielectric film deposition
Publication Date: 2025.04.24 LAM RES CORP
  • US20250132127A1 patent drawing
  • US20250132127A1 patent drawing
  • US20250132127A1 patent drawing

AI summary

An apparatus, comprising: a process chamber, wherein the process chamber comprises: a window, wherein the window comprises a dielectric material that is transmissive to radio frequency (RF) energy, wherein the window has a first side and a second side opposite the first side; a collar assembly having an aperture covered by the window, wherein the collar assembly supports the first side of the window; and one or more RF coils positioned above the second side of the window, wherein, when viewed along a first axis perpendicular to the window, a radial distance between an outermost portion of the one or more RF coils and an innermost portion of an electrically conductive portion of the collar assembly that intersects with a first reference plane that is perpendicular to the first axis and between the first side of the window and the one or more RF coils is greater than or equal to 40 mm.