Plasma Emission Spectral Matching for Accurate Peak Identification
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing plasma processing technologies face challenges in accurately identifying chemical elements or molecules based on peak shape features in emission data, leading to incorrect assignments or double assignments, which can be exacerbated by reliance on analyst experience.
Innovation Solution
A plasma processing apparatus and data analysis apparatus that utilize an analysis unit to identify chemical elements or molecules by comparing spectral waveforms with a weighted coefficient, enhancing accuracy through match degree calculations and peak shape analysis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If only wavelength and intensity of peak are used for identification, then analysis is simplified, but identification accuracy deteriorates due to inability to capture peak shape features
Solution Approach 1:
The spectral waveform is segmented into multiple wavelength regions, with different weight coefficients applied to different segments. This allows the analysis to capture both simplified overall trends and detailed peak shape features simultaneously, resolving the contradiction between analysis simplicity and identification accuracy.
Solution Approach 2:
The invention changes the parameter of wavelength weighting by introducing weight coefficients that vary across different wavelength regions. This parameter change enables the analysis to emphasize different parts of the spectral waveform, thereby capturing peak shape features while maintaining analytical tractability.
2Extent of automation
If pattern matching is used for element identification, then automated analysis is achieved, but double assignment of elements to peaks occurs reducing reliability
Solution Approach 1:
Different weight coefficients are assigned to different wavelength regions based on their local characteristics. This local quality approach allows the automated analysis to adapt to specific peak shapes in different regions, preventing incorrect double assignments while maintaining automation.
Solution Approach 2:
The weight coefficients are made dynamic and adjustable based on the specific spectral characteristics being analyzed. This dynamic approach allows the automated system to adapt to varying peak shapes and conditions, improving reliability while maintaining automation capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise chemical element or molecule identification with high accuracy by leveraging spectral waveform matching and weighted coefficients, reducing human error and improving troubleshooting in plasma processing.
Implementation Method 1
a radio-frequency power supply that supplies radio-frequency power to generate plasmas
Implementation Method 2
an ionization phenomenon by plasmas is accompanied by a luminous phenomenon
Data Source
AI summary
Provided is a plasma processing apparatus, a data analysis apparatus, and a semiconductor device manufacturing system, capable of assigning an appropriate chemical element or molecule on the basis of the features of a peak shape and capable of performing wavelength identification with high accuracy. The plasma processing apparatus includes: a processing chamber in which a sample is plasma-processed; a radio-frequency power supply that supplies radio-frequency power to generate plasmas; and a sample table on which the sample is placed, the plasma processing apparatus further including an analysis unit that identifies chemical elements or molecules in monitored plasmas on the basis of a match degree between a first spectral waveform and a second spectral waveform, the match degree being obtained by comparing the first spectral waveform with the second spectral waveform, the first and second spectral waveforms being spectral waveforms of the emission of the monitored plasmas, wherein the second spectral waveform is a spectral waveform multiplied by a weight coefficient corresponding to the chemical element or the molecule.