Plasma Spectroscopy Defoaming Agent Non-Target Emission

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing plasma spectroscopic analysis methods face challenges in accurately analyzing target metal elements due to overlapping peak waveforms from non-targets, which can be present in the sample, leading to incorrect detection of target peak waveforms.

Innovation Solution

A plasma spectroscopic analysis method that involves concentrating the target near electrodes in the presence of a defoaming agent during plasma generation, suppressing non-target plasma emission without the need for sample filtration pretreatment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If sample filtration pretreatment is applied to remove non-targets, then plasma emission from non-targets is reduced, but the concentration of the target in the sample may change

Engineering Contradiction:
Improveplasma emission detection accuracyVSAvoidtarget concentration
Core Design Contradiction:
Measurement precisionVSQuantity of substance

Solution Approach 1:

The invention extracts and removes non-target substances from the sample through filtration pretreatment before plasma generation. This extraction process eliminates the source of interfering peak waveforms, allowing for accurate detection of target plasma emission without altering the target concentration, thereby resolving the contradiction between measurement precision and quantity preservation

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The invention performs filtration pretreatment as a preliminary action before plasma generation and detection. By removing non-targets in advance, the sample is prepared in an optimal state for plasma analysis, ensuring that both the target concentration remains unchanged and the plasma emission detection accuracy is improved

Inventive Principle:
Principle #10Preliminary action

2Quantity of substance

If no sample pretreatment is applied, then the target concentration in the sample is maintained, but plasma emission from non-targets overlaps with target peak waveforms

Engineering Contradiction:
Improvetarget concentrationVSAvoidpeak waveform detection accuracy
Core Design Contradiction:
Quantity of substanceVSMeasurement precision

Solution Approach 1:

The invention extracts non-target substances from the sample through filtration, removing the source of overlapping peak waveforms. This extraction process maintains the target concentration while eliminating interference, thereby improving peak waveform detection accuracy without losing target material

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The invention performs filtration as a preliminary action before plasma generation. This advance preparation removes non-targets that would otherwise cause peak waveform overlap, ensuring both target concentration maintenance and accurate detection when plasma is generated

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method allows for accurate detection of target plasma emission by reducing non-target interference, maintaining target concentration integrity, and enhancing analysis sensitivity.

Implementation Method 1

a plasma generation process of generating plasma in the sample by applying a voltage to the pair of electrodes; and a detection process of detecting emission of the target generated by the plasma

Methodology Applied
Scientific EffectPlasma emission: Plasma

Implementation Method 2

capable of suppressing plasma emission derived from a non-target without subjecting a sample to a pretreatment by filtration

Methodology Applied
Scientific EffectInhibition of plasma emission: Plasma

Data Source

PatentEP3306314B1Plasma spectroscopic analysis method and inhibitor of plasma emission derived from non-target
Publication Date: 2021.01.20 ARKRAY INC
  • EP3306314B1 patent drawingFigure 1A~1B
  • EP3306314B1 patent drawingFigure 2A~2B
  • EP3306314B1 patent drawingFigure 3A~3B

AI summary

A plasma spectroscopic analysis method includes a concentration process of concentrating a target in a sample, in the vicinity of one of a pair of electrodes in the presence of the sample; a plasma generation process of generating plasma in the sample by applying a voltage to the pair of electrodes; and a detection process of detecting emission of the target generated by the plasma, wherein the plasma generation process is performed in the presence of a defoaming agent.