Plasma-Sprayed Polysilicon Support Ring for Thermal Cycling Durability
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Solution Overview
Problem
Conventional coatings for quartz support rings in thermal processing chambers suffer from limitations such as size constraints, incomplete coverage, and poor adhesion leading to delamination and cracking during thermal cycling, which compromises their functionality and longevity.
Innovation Solution
A polysilicon coating is applied to the support ring using a plasma spray deposition process, which enhances adhesion, allows for larger ring sizes, and reduces electromagnetic radiation transmission, while being cost-effective and avoiding the need for expensive masking processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If CVD process is used to form coating on support ring, then coating can be formed, but coating adhesion is poor and delamination occurs during thermal cycling
Solution Approach 1:
The patent changes the deposition parameters by using plasma spray deposition instead of CVD, operating at atmospheric pressure with higher temperature plasma jet to achieve better coating adhesion and prevent delamination during thermal cycling
Solution Approach 2:
The patent applies a multi-layer composite coating structure with polysilicon as the primary coating material, potentially combined with other materials to enhance adhesion to the quartz substrate while maintaining radiation shielding properties
2Reliability
If CVD process is used to form coating on support ring, then coating can be formed, but cracking develops after repeated thermal cycles
Solution Approach 1:
The patent modifies the deposition parameters by using plasma spray deposition with controlled plasma temperature and deposition rate, creating a coating with improved flexibility and crack resistance during thermal cycling
Solution Approach 2:
The patent creates a coating with varying properties through the deposition process, where the coating structure transitions from the substrate interface outward, providing enhanced crack resistance while maintaining radiation shielding functionality
3Temperature
If quartz support ring is used, then thermal resistance is good, but radiation transparency causes interference with temperature detection
Solution Approach 1:
The patent combines quartz substrate with a polysilicon coating layer, where the quartz provides thermal resistance and the polysilicon coating provides radiation shielding, creating a composite structure that addresses both requirements simultaneously
Solution Approach 2:
The patent applies the coating selectively to specific regions of the quartz support ring, providing radiation shielding only where needed while maintaining the thermal properties of the quartz structure
4Manufacturing precision
If CVD process is used for coating, then coating can be deposited, but expensive masking is required to control coating regions
Solution Approach 1:
The patent removes the masking step entirely by using plasma spray deposition, which allows direct deposition of coating material onto the support ring without requiring masks to define coating regions
Solution Approach 2:
The plasma spray deposition process inherently provides control over coating deposition through the plasma jet direction and movement, eliminating the need for external masking components
5Manufacturing precision
If conventional coating methods are used, then coating can be applied, but complete coverage is not achieved on all regions
Solution Approach 1:
The patent uses a dynamic plasma spray deposition process where the plasma jet can be moved or the support ring can be rotated, ensuring complete and uniform coating coverage on all surfaces including complex geometries
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polysilicon coating improves the support ring's durability and radiation shielding, ensuring reliable temperature detection and extending the ring's lifespan by preventing delamination and cracking, while reducing manufacturing costs.
Implementation Method 1
A coating is formed by a plasma spray deposition process
Implementation Method 2
a rapid thermal processing (RTP) chamber may be used to heat the substrate utilizing lamps disposed below the substrate. The substrate may be rapidly heated to an elevated temperature within a temperature range of 600° C. to 1300° C. using electromagnetic energy emitted from the lamps
Implementation Method 3
Because quartz is transparent to light and infrared energy, the quartz support ring may be coated with a material to render it opaque to the lamp radiation
Data Source
AI summary
The present disclosure relates to a support ring for a thermal processing chamber. The support ring has a polysilicon coating. The polysilicon coating is formed using a plasma spray deposition process.