Plasma Stage Deposit Control Ring and Focus Ring Gap
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In plasma processing, it is challenging to independently control the temperature of the focus ring to prevent adhesion of reaction by-products (deposits) on the peripheral portions of the stage while maintaining appropriate temperature control for the focus ring.
Innovation Solution
A stage design featuring a focus ring and a deposit control ring with a radial gap between them, allowing independent temperature control of each, where the deposit control ring is heated separately from the focus ring to prevent adhesion of deposits.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the focus ring temperature is controlled to prevent thermal effects on the substrate, then the substrate processing quality is improved, but deposit adhesion on the stage peripheral portions increases
Solution Approach 1:
The invention divides the ring structure into two separate components: a focus ring and a deposit control ring, positioned at different radial locations. This segmentation allows independent temperature control of each ring, enabling the focus ring to maintain low temperature for substrate quality while the deposit control ring can be heated to prevent deposit adhesion on stage peripheral portions.
Solution Approach 2:
The invention applies different thermal conditions to different spatial zones: the focus ring region maintains low temperature to prevent thermal effects on the substrate, while the deposit control ring at the stage periphery is heated to prevent deposit adhesion. This local differentiation of thermal properties resolves the contradiction between substrate processing quality and deposit prevention.
2Temperature
If the focus ring is cooled to maintain low temperature, then substrate thermal effects are minimized, but deposit adhesion on the stage side wall increases
Solution Approach 1:
The ring structure is segmented into a focus ring for substrate support and a separate deposit control ring for preventing deposit adhesion. This allows the focus ring to be cooled independently to maintain low temperature, while the deposit control ring can be heated separately to prevent deposits on the stage side wall.
Solution Approach 2:
The deposit control ring acts as an intermediary element between the focus ring and the stage side wall. It is positioned radially outward from the focus ring and can be heated independently to create a thermal barrier that prevents deposit adhesion on the stage peripheral portions, while not interfering with the low-temperature maintenance of the focus ring.
3Device complexity
If a single ring structure is used, then the device complexity is reduced, but independent temperature control of focus ring and deposit prevention is not achievable
Solution Approach 1:
The single ring structure is divided into two separate rings: a focus ring and a deposit control ring. This segmentation increases device complexity slightly but enables independent temperature control of each ring, allowing the focus ring to be cooled for substrate quality while the deposit control ring is heated for deposit prevention.
Solution Approach 2:
The two-ring configuration provides multi-functionality: the focus ring serves the primary function of supporting the substrate and controlling its thermal environment, while the deposit control ring provides the additional function of preventing deposit adhesion on stage peripheral portions. This universal design approach allows a single stage structure to accomplish multiple temperature control objectives.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively reduces deposit adhesion on the stage's peripheral portions and allows precise temperature control of the focus ring, enhancing plasma processing efficiency.
Implementation Method 1
a base including an adsorption electrode therein; a focus ring provided above the adsorption electrode and sucked and held on the base
Data Source
AI summary
A stage on which a substrate is disposed includes: a base embedded with an adsorption electrode therein; a focus ring provided above the adsorption electrode and adsorbed and held on the base; and a deposit control ring provided radially inside the focus ring on the base. A gap is formed between the focus ring and the deposit control ring in a radial direction to separate the focus ring and the deposit control ring.