Plasma State Estimation Using 2D Sensor Distribution Mapping
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Solution Overview
Problem
Conventional plasma processing technologies can only detect the plasma state at the installation position of a plasma probe, limiting the ability to estimate the plasma state, especially above a substrate, in a processing container.
Innovation Solution
A plasma processing apparatus equipped with multiple sensors and a controller that obtains a two-dimensional distribution of the plasma state relative to sensor positions, using Zernike polynomials to decompose and reconstruct the plasma state, enabling estimation and abnormality detection within the processing container.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a single plasma probe is provided at a specific position to detect plasma state, then the detection point is fixed and simple, but the plasma state above the substrate cannot be accurately estimated
Solution Approach 1:
The processing container is divided into multiple detection zones with sensors positioned at different locations (side wall, top wall, and/or bottom wall). Each sensor measures plasma state at its specific position, and the controller segments the overall plasma state estimation into multiple local measurements that are then integrated to reconstruct the complete two-dimensional distribution above the substrate.
Solution Approach 2:
The system transitions from one-dimensional point measurement by a single probe to two-dimensional distribution measurement by arranging multiple sensors in different spatial positions. The controller reconstructs the two-dimensional plasma state distribution by combining measurements from sensors at various heights and radial positions, adding spatial dimensionality to the measurement capability.
2Loss of information
If multiple sensors are arranged to measure plasma state at different positions, then the plasma state distribution can be estimated, but the device structure becomes complex
Solution Approach 1:
The sensors are designed with multi-functionality to detect various plasma state parameters (electron density, ion density, temperature, etc.) at different spatial positions. The controller performs multiple functions including data acquisition from all sensors, two-dimensional distribution reconstruction, plasma state estimation, and abnormality detection, making the system universally capable of comprehensive plasma monitoring.
Solution Approach 2:
The controller acts as an intermediary that processes and integrates data from multiple distributed sensors. It reconstructs the two-dimensional plasma state distribution by combining measurements from sensors at different positions and uses this reconstructed distribution to estimate the overall plasma state and detect abnormalities, mediating between raw sensor data and meaningful plasma state information.
3Measurement precision
If plasma state is measured only at sensor installation positions, then the measurement is straightforward, but the plasma state above the substrate remains unknown
Solution Approach 1:
The system performs preliminary measurement actions by positioning sensors at strategic locations (side wall, top wall, and/or bottom wall) to capture plasma state data before the plasma state evolves significantly. The controller uses these preliminary measurements to reconstruct the two-dimensional distribution and estimate the plasma state above the substrate, performing the estimation action based on pre-captured spatial data.
Solution Approach 2:
The controller creates a copied representation of the plasma state distribution by reconstructing the two-dimensional map from discrete sensor measurements. Instead of directly measuring every point above the substrate, the system copies the plasma state information from sensor positions through mathematical reconstruction, generating a virtual model of the plasma distribution that can be analyzed without physical intrusion.
Data Source
AI summary
There is a plasma processing apparatus comprising: a processing container in which a mounting table on which a substrate is mounted is arranged and plasma processing is performed; a plurality of sensors for detecting a state of plasma generated in the processing container; and a controller for estimating a state of plasma in the processing container based on the state of plasma obtained from the plurality of sensors, wherein the controller obtains a two-dimensional distribution representing the state of plasma with respect to installation positions of the plurality of sensors, from data obtained from the plurality of sensors, and estimates the state of plasma in the processing container based on the obtained two-dimensional distribution.