Plasma Surgical Device Dynamic Gas Flow Control
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Solution Overview
Problem
Plasma surgical devices face instability in plasma generation due to constant plasma gas flow rates, which are not adjusted based on the distance between the applicator and the tissue, leading to potential plasma break-off and inefficient gas consumption.
Innovation Solution
Incorporating a control unit and flow regulator that dynamically adjust the plasma gas flow rate based on operating variables such as DC offset voltage, amplitude, or effective value of the HF current/voltage, ensuring a stable plasma concentration by increasing flow at larger distances and decreasing it at closer proximity to the tissue.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a constant plasma gas flow rate is used, then the device operation is simple, but the plasma stability deteriorates when the distance between applicator and tissue varies
Solution Approach 1:
The plasma gas flow rate is changed from constant to dynamic, automatically adjusting according to the distance between applicator and tissue. The control unit receives distance information and modifies the flow rate in real-time, transforming a static system into a dynamic one that adapts to varying operational conditions.
Solution Approach 2:
The system implements feedback control by monitoring the distance between applicator and tissue (via operating variables) and using this information to adjust the plasma gas flow rate. This closed-loop control ensures plasma stability by continuously adapting the flow rate to the current operational state.
2Stability of the object's composition
If the plasma gas flow rate is increased to maintain plasma stability at larger distances, then the plasma stability improves, but the gas consumption increases
Solution Approach 1:
The plasma gas flow rate is dynamically adjusted based on the actual distance between applicator and tissue. When distance is large, flow rate increases to maintain plasma stability; when distance is small, flow rate decreases to reduce gas consumption. This dynamic adaptation eliminates the need for continuously high gas flow.
Solution Approach 2:
The system changes the plasma gas flow rate parameter according to the operational distance. By varying this critical parameter in response to distance changes, the system maintains plasma stability only when necessary (at larger distances) while reducing consumption at closer distances where less gas is needed.
3Loss of substance
If the plasma gas flow rate is decreased to reduce gas consumption, then the gas consumption decreases, but the plasma may break off
Solution Approach 1:
The plasma gas flow rate is dynamically controlled to match the actual operational needs. The control unit adjusts the flow rate in real-time based on distance feedback, ensuring the plasma remains stable when distance requires higher flow while minimizing gas consumption when distance is small and less gas is needed for plasma maintenance.
Solution Approach 2:
The system adaptively changes the plasma gas flow rate parameter based on operational conditions. By monitoring distance and adjusting the flow rate parameter accordingly, the system maintains plasma continuity only when necessary while optimizing gas consumption at all times.
4Stability of the object's composition
If a high plasma gas flow rate is used to ensure plasma stability, then the plasma stability improves, but the therapeutic effectiveness decreases due to excessive gas interference
Solution Approach 1:
The plasma gas flow rate is dynamically adjusted to provide optimal plasma stability without excessive gas flow. By adapting the flow rate to the actual distance and operational conditions, the system maintains stable plasma only when necessary while minimizing gas interference with the therapeutic effect on tissue.
Solution Approach 2:
The system optimizes the plasma gas flow rate parameter by changing it according to operational distance. This ensures sufficient plasma stability for reliable operation while preventing excessive gas flow that would interfere with therapeutic effectiveness, achieving an optimal balance between stability and treatment quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach maintains a stable plasma concentration, prevents break-off, optimizes gas consumption, and enhances the therapeutic effectiveness while reducing costs by adjusting the plasma gas flow according to the distance and operational parameters in real-time.
Implementation Method 1
A high-frequency alternating voltage is applied to an RF electrode in an applicator. At a sufficiently high RF voltage and a sufficiently small distance to the tissue, plasma is formed between the tissue and a distal end of the applicator.
Implementation Method 2
The ionized plasma is electrically conductive, so an electrical current is applied from the applicator into the tissue.
Implementation Method 3
The current, conducted through the plasma and impinging on the tissue surface, creates a thermal effect, thus leading to hemostasis or coagulation.
Implementation Method 4
Plasma surgery devices are based on the thermal effect of a high-frequency current, which is applied to the tissue via an electrically ionized plasma
Data Source
Figure 1
AI summary
The invention relates to a plasma-surgical device (2), comprising a HF generator (4) for generating a HF activation signal, a gas source (6) for providing a plasma gas, and a plasma applicator (8) having a channel (14) which opens out at a distal end (16) of the applicator and through which the plasma gas can flow, and having a HF electrode that is electrically connected to the HF generator, wherein the HF electrode can be supplied with the HF activation signal such that a plasma (18) can be provided originating from the distal end (16) of the applicator. The plasma-surgical device is developed such that it comprises a control unit (28) and a through-flow regulator (30) for regulating a through flow rate of plasma gas provided by the gas source in the channel (14), wherein the control unit is configured to receive or request an operating variable of the HF generator, and, according to a recorded functional context, to control the through-flow regulator in such a way that the through-flow rate of the plasma gas is correlated with a detected value of the operating variable.