Plasma Tool Component Diagnosis Using Robust Deterioration Models
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Solution Overview
Problem
Existing diagnosis methods for plasma processing apparatuses lack the ability to define deterioration state computation conditions with high robustness for each component, and these conditions are not applicable across multiple plasma processing apparatuses, leading to inefficiencies in unplanned maintenance.
Innovation Solution
A diagnosis device and method that calculate a robustness degree for each component under multiple computation conditions, select the most suitable condition based on this degree, and diagnose deterioration states using that condition, applicable across plasma processing apparatuses.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a diagnosis device uses sensor values to diagnose deterioration state of plasma processing apparatus components, then the deterioration state can be monitored, but the diagnosis accuracy is insufficient because a single computation condition cannot capture different deterioration signs for different components
Solution Approach 1:
The invention segments the single deterioration degree computation into multiple computation conditions (first, second, third computation conditions) that compute different aspects of deterioration. Each computation condition processes sensor values differently to capture various deterioration signs specific to different component types, thereby improving diagnosis accuracy without requiring a single complex computation model
Solution Approach 2:
The invention dynamically selects which computation condition to apply based on the target component type. The diagnosis device chooses the appropriate computation condition (first for RF power supply, second for chamber, third for other components) according to the specific component being diagnosed, allowing the system to adapt its computation approach to match the deterioration characteristics of each component
2Adaptability or versatility
If deterioration degree computation conditions are defined for each component type, then component-specific diagnosis can be achieved, but the conditions lack robustness and cannot be applied across multiple plasma processing apparatuses
Solution Approach 1:
The invention creates computation conditions that are universally applicable across multiple plasma processing apparatuses while maintaining component-specific diagnostic capabilities. The first computation condition (using RF power and time) universally applies to RF power supplies, the second (using pressure and time) universally applies to chambers, and the third universally applies to other components, allowing the same diagnostic framework to be deployed across different apparatuses
Solution Approach 2:
The invention changes the parameters used in computation based on component type. Different computation conditions use different sensor value parameters (RF power for power supply, pressure for chamber, other parameters for components) and different time periods, allowing each component to be diagnosed with parameters most relevant to its deterioration characteristics while maintaining overall system robustness
3Ease of operation
If periodic maintenance is performed based on wafer processing count, then maintenance scheduling is simple, but unplanned maintenance occurs due to component deterioration not being detected early
Solution Approach 1:
The invention introduces continuous feedback through real-time monitoring of sensor values and computation of deterioration degrees. The system continuously computes deterioration degrees using appropriate computation conditions and compares them against thresholds, providing ongoing feedback about component health status. This enables early detection of deterioration trends before they lead to failures, allowing maintenance to be scheduled proactively rather than reactively
Solution Approach 2:
The invention performs preliminary diagnosis actions by continuously monitoring and computing deterioration degrees before actual component failure occurs. By calculating deterioration degrees based on sensor values and comparing them to thresholds, the system identifies components that are approaching failure states, enabling maintenance to be performed in advance to prevent unplanned downtime
Data Source
AI summary
A diagnosis device that uses information from state sensors provided in a plasma processing apparatus for plasma processing a specimen to diagnose deterioration states of components configuring the plasma processing apparatus includes an execution unit that computes and calculates deterioration degree of each of the components configuring the plasma processing apparatus on the basis of the information from the state sensors, and an analysis unit that sets a computation condition for computing and calculating the deterioration degree by the execution unit on the basis of the information from the state sensors and calculates a maintenance period of the plasma processing apparatus on the basis of the information of the deterioration degree of each of the components configuring the plasma processing apparatus computed and calculated by the execution unit, and makes it possible to decide deterioration degree computation condition having high robustness for each of the components.