Parallel Energy Storage in Plasma Tools for Stable Output Voltage
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Solution Overview
Problem
The plasma processing apparatus experiences fluctuations in output voltage due to load fluctuations in the electricity storage unit, which can affect the stability and efficiency of the plasma processing.
Innovation Solution
The apparatus is configured with two plasma processing units, each with a plasma processing chamber, substrate support, high frequency power supply, electrode, power consuming member, ground frame, electricity storage unit, power receiving coil, and rectifying and smoothing unit. These units are connected in parallel, allowing the electricity storage units to share power and stabilize the output voltage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single electricity storage unit is used in the plasma processing apparatus, then the device complexity is reduced, but the output voltage fluctuates due to load changes
Solution Approach 1:
The patent combines multiple electricity storage units (first and second electricity storage units) into a single plasma processing apparatus, connecting them in parallel to share load fluctuations. This merging approach stabilizes the output voltage supplied to the power consuming member while maintaining manageable system complexity through integrated design.
2Reliability
If multiple electricity storage units are connected in parallel, then the output voltage stability is improved, but the device complexity increases
Solution Approach 1:
The patent introduces a control device as an intermediary that manages the parallel-connected electricity storage units. This control device coordinates the operation of multiple storage units, handling the complexity of parallel configuration while delivering stable output voltage to the power consuming member, thus isolating the complexity from the core power supply function.
3Productivity
If the electricity storage unit operates alone without parallel connection, then the device complexity is low, but the productivity is reduced due to voltage fluctuations affecting processing efficiency
Solution Approach 1:
The patent merges multiple electricity storage units into a coordinated power supply system that maintains stable voltage during plasma processing. This stability prevents processing interruptions and maintains optimal plasma generation conditions, thereby improving productivity while the integrated design keeps the added complexity manageable.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively reduces voltage fluctuations, enhancing the stability and efficiency of the plasma processing by ensuring a consistent power supply to the power consuming members.
Implementation Method 1
The power receiving coil is electrically connected to the electricity storage unit and capable of receiving power from a power transmitting coil by electromagnetic induction coupling
Data Source
AI summary
A plasma processing apparatus comprises a first plasma processing apparatus and a second plasma processing apparatus. Each of the first plasma processing apparatus and the second plasma processing apparatus comprises a plasma processing chamber, a substrate support, a high frequency power supply, an electrode or an antenna, a power consuming member, a ground frame, an electricity storage unit, a power receiving coil and a rectifying and smoothing unit. The ground frame is grounded and surrounding the substrate support together with the plasma processing chamber. Each of the first plasma processing apparatus and the second plasma processing apparatus is configured such that, with respect to the power consuming member thereof, the electricity storage unit thereof and the electricity storage unit of a remaining one of the first plasma processing apparatus and the second plasma processing apparatus are connectable in parallel.