Folded Waveguide Resonator for Plasma Frequency Tuning
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Solution Overview
Problem
Current plasma processing apparatuses using radio frequency waves for substrate processing face limitations in efficiently adjusting resonance frequencies and optimizing electromagnetic wave propagation, which affects plasma generation and processing efficiency.
Innovation Solution
The proposed plasma processing apparatus includes a resonator with a waveguide path featuring folded portions and adjustable dielectric materials to adjust resonance frequencies, allowing for optimized electromagnetic wave propagation and plasma generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a conventional waveguide path is used in the resonator, then the structure is simple, but the resonance frequency adjustment capability is limited
Solution Approach 1:
The waveguide path is designed with movable walls that can be adjusted to change the resonance frequency of the resonator. This dynamic structure allows the resonator to adapt to different processing requirements by tuning the resonance frequency, resolving the contradiction between adaptability and structural simplicity.
Solution Approach 2:
The resonator is divided into multiple resonant cavities separated by partition walls, with each cavity having its own waveguide path. This segmentation allows independent adjustment of resonance frequencies in different cavities, enhancing overall adaptability while maintaining manageable structural complexity.
2Productivity
If dielectric materials are added to the waveguide path to maximize effective dielectric constants, then plasma generation efficiency is improved, but the device complexity increases
Solution Approach 1:
Dielectric materials are selectively placed in specific regions of the waveguide path where they can maximize the effective dielectric constant and enhance plasma generation efficiency. This localized approach improves productivity while minimizing the overall structural complexity compared to uniform dielectric filling.
Solution Approach 2:
The resonator employs composite structures combining conductive walls with dielectric materials in the waveguide path. This composite approach optimizes electromagnetic field distribution and plasma generation efficiency while maintaining a manageable structural complexity through the systematic integration of different materials.
3Productivity
If the waveguide path has folded portions, then electromagnetic wave propagation is optimized, but the resonator volume increases
Solution Approach 1:
The waveguide path incorporates folded portions that extend in multiple dimensions rather than a simple linear path. This dimensional complexity allows the electromagnetic waves to traverse a longer effective path within a compact volume, optimizing propagation efficiency without proportionally increasing the resonator's overall volume.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the adjustment of resonance frequencies, improving plasma generation and processing efficiency by ensuring uniform electric field distribution and maximizing effective dielectric constants, thereby optimizing substrate processing.
Implementation Method 1
a resonator installed on the excitation electrode and electromagnetically coupled to the discharger. The resonator includes a waveguide path including a plurality of folded portions between a first end and a second end of the resonator
Implementation Method 2
a resonator installed on the excitation electrode and electromagnetically coupled to the discharger
Implementation Method 3
The at least one adjustor configured to adjust a resonance frequency of the electromagnetic waves propagating in the waveguide path is installed in the waveguide path
Implementation Method 4
a discharger configured to discharge electromagnetic waves into a plasma generation space below the excitation electrode
Data Source
AI summary
A plasma processing apparatus includes: a chamber including a processing space inside the chamber; a substrate support installed in the processing space; an excitation electrode installed above the substrate support; a discharger configured to discharge electromagnetic waves into a plasma generation space below the excitation electrode; and a resonator installed on the excitation electrode and electromagnetically coupled to the discharger. The resonator includes a waveguide path including a plurality of folded portions between a first end and a second end of the resonator. At least one adjustor configured to adjust a resonance frequency of the electromagnetic waves propagating in the waveguide path is installed in the waveguide path.