Plasma Processing Apparatus Peripheral Waveguide
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in generating uniform plasma distribution across the substrate processing space, leading to inconsistencies in plasma density and radical uniformity, particularly due to variations in electromagnetic wave propagation and plasma generation space geometry.
Innovation Solution
The plasma processing apparatus incorporates a conductive upper shower head and lower shower plate with a dielectric electromagnetic wave introduction part and a waveguide that forms a resonator, allowing electromagnetic waves to propagate circumferentially without a coaxial line on the central axis, creating a uniform electric field and enhancing plasma generation uniformity by adjusting the distance between the shower head and plate and using a coaxial line to supply electromagnetic waves.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a coaxial line is placed on the central axis to supply electromagnetic waves, then electromagnetic wave supply is simplified, but plasma uniformity deteriorates due to non-uniform electric field distribution
Solution Approach 1:
The invention extracts the coaxial line from the central axis position and relocates it to the peripheral region. This separation removes the source of non-uniform electric field distribution from the center, allowing the electromagnetic waves to be supplied while maintaining plasma uniformity across the substrate processing space.
Solution Approach 2:
The waveguide acts as an intermediary component that transfers electromagnetic waves from the coaxial line (located peripherally) to the plasma generation space. This mediator enables the coaxial line to be positioned away from the center while still effectively supplying electromagnetic waves to maintain plasma generation.
2Productivity
If the distance between shower head and plate is reduced to improve plasma generation efficiency, then productivity increases, but plasma uniformity deteriorates due to increased absorption and non-uniform distribution
Solution Approach 1:
The invention changes the spatial parameter of the coaxial line position from central to peripheral, which fundamentally alters the electric field distribution pattern. This parameter change allows for optimized distance between shower head and plate while maintaining uniform plasma generation, as the peripheral positioning reduces plasma absorption effects compared to central positioning.
3Manufacturing precision
If electromagnetic wave propagation path is extended to cover the entire substrate space, then plasma uniformity improves, but device complexity increases
Solution Approach 1:
The waveguide structure serves multiple functions: it supplies electromagnetic waves from the peripherally located coaxial line, distributes them uniformly across the plasma generation space, and maintains resonance conditions. This multi-functional design achieves comprehensive plasma uniformity without requiring multiple separate components or complex arrangements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures uniform plasma generation and radical distribution across the substrate processing space, maintaining resonance and reducing plasma absorption, resulting in enhanced plasma uniformity and process efficiency.
Implementation Method 1
the waveguide and the plasma generation space constitute a resonator, and the resonator generates resonance of electromagnetic waves
Implementation Method 2
an electromagnetic wave introduction part that is formed of a dielectric material and provided between the upper shower head and the lower shower plate, wherein the electromagnetic wave introduction part extends in a circumferential direction with respect to a central axis to surround the plasma generation space
Implementation Method 3
a coaxial line that includes a central conductor and an outer conductor and is provided to supply electromagnetic waves to the waveguide, wherein the coaxial line extends away from the central axis
Implementation Method 4
a plasma generation space in which plasma of a gas supplied through the plurality of gas holes is generated
Data Source
AI summary
A plasma processing apparatus includes a chamber providing a substrate processing space, a conductive upper shower head providing a plurality of gas holes and provided above the substrate processing space, a conductive lower shower plate providing through holes connected to the substrate processing space and provided under the upper shower head and above the substrate processing space, an electromagnetic wave introduction part formed of a dielectric material, a waveguide extending in the circumferential direction to surround the upper shower head and the electromagnetic wave introduction part and connected to the electromagnetic wave introduction part, and a coaxial line including a central conductor and an outer conductor and provided to supply electromagnetic waves to the waveguide. The coaxial line extends away from the central axis. The central conductor is connected to a wall surface that defines the waveguide at a position away from the central axis.