Surface Plasmon Color Filter for FFS LCD Transmittance
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Solution Overview
Problem
Conventional Liquid Crystal Display (LCD) devices have low aperture and transmittance ratios due to the use of general color filters, which increase power consumption and require complex fabrication processes, limiting their efficiency and productivity.
Innovation Solution
A Fringe Field Switching (FFS) mode LCD device is developed using a surface plasmon phenomenon to form a color filter with a sub-wavelength transmissive pattern on a metal layer, acting as a common electrode, which enhances transmittance and eliminates the need for traditional color filter processing lines, thereby increasing the aperture ratio and reducing power consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a general color filter using pigments or dyes is used, then colors can be implemented by absorbing unnecessary light, but the transmittance ratio is reduced to 5% or less and power consumption increases
Solution Approach 1:
The patent replaces the conventional pigment/dye-based color filter with a surface plasmon-based color filter. The surface plasmon phenomenon occurs when light interacts with electrons at the metal-dielectric interface, creating resonant oscillations that selectively transmit specific wavelengths. This physical phenomenon substitution eliminates the need for light-absorbing pigments, thereby dramatically improving transmittance ratio and reducing backlight power consumption.
Solution Approach 2:
The patent changes the fundamental operating parameter of the color filter from light absorption (pigment-based) to light resonance transmission (surface plasmon-based). By adjusting the metal layer thickness, pattern geometry, and periodic structure, the filter selectively transmits different wavelengths corresponding to RGB colors. This parameter change enables high transmittance while maintaining color separation functionality.
2Ease of manufacture
If a general color filter is fabricated with complicated processes including color resist coating, exposure, development and hardening, then colors can be implemented, but the number of mask processes increases and productivity decreases
Solution Approach 1:
The patent extracts and removes the complex multi-step color filter fabrication processes (color resist coating, exposure, development, hardening) from the manufacturing flow. Instead, it employs a simplified process where a metal layer is deposited and patterned using standard semiconductor fabrication techniques, leveraging the existing TFT processing line capabilities without requiring separate color filter processing lines.
Solution Approach 2:
The patent makes the TFT processing line universal by enabling it to produce both the transistor structures and the color filter patterns using the same equipment and processes. The metal layer deposition and patterning steps used for TFT electrodes are simultaneously used to create the surface plasmon color filter structure, eliminating the need for dedicated color filter processing lines and increasing productivity.
3Ease of manufacture
If the color filter is formed separately from the TFT processing lines, then color filter processing can be performed, but line installation costs increase
Solution Approach 1:
The patent merges the color filter formation process with the TFT processing lines by using the same metal deposition and patterning equipment. The color filter is formed as an integrated part of the array substrate manufacturing process, combining what were previously separate operations into a unified fabrication flow, thereby reducing line installation costs and facility complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution significantly enhances the transmittance ratio and aperture ratio of the LCD panel, reducing power consumption and simplifying the fabrication process, while allowing for high-temperature processing and improved color reproduction.
Implementation Method 1
forming a color filter having an enhanced transmittance ratio by using a surface plasmon phenomenon
Data Source
AI summary
Discussed are an FFS mode LCD device capable of enhancing a transmittance ratio by including a color filter of a three-dimensional pattern structure having a transmissive pattern for selectively transmitting light of a specific wavelength by using a surface plasmon phenomenon, and a method for fabricating the same. The metal layer using a surface plasmon is utilized as a common electrode of the array substrate, and the pixel electrode having slits is formed on the metal film, thereby generating a fringe field. This may simplify the entire processes, and remove color filter processing lines, thereby reducing the installation costs.