Plasmon-Assisted CVD for Sub-Nanometer Film Deposition

The patent applies local quality by using metallic nanoparticles as localized heating sources that convert electromagnetic radiation into heat at specific positions on the substrate. This creates spatially non-uniform temperature distribution, enabling precise control of deposition location and line width while maintaining overall process throughput. The nanoparticles act as localized reaction zones rather than heating the entire substrate uniformly.

The patent changes the temperature parameter locally by utilizing plasmon resonance heating of metallic nanoparticles. By controlling the concentration, size, and distribution of nanoparticles, the local temperature can be precisely adjusted to enable deposition at specific locations. This parameter control allows overcoming the diffraction limit by using nanoparticle-mediated localized heating rather than conventional uniform thermal or photonic approaches.

The patent introduces metallic nanoparticles as intermediary agents that mediate between electromagnetic radiation and the substrate. These nanoparticles absorb electromagnetic radiation and convert it to heat through plasmon resonance, acting as thermal intermediaries. This approach is more efficient than direct laser heating because the nanoparticles have high absorption cross-sections and can be distributed uniformly, reducing the required radiation power while maintaining spatial control.

The patent replaces the mechanical/optical system of focused laser beams with an electromagnetic field that excites plasmon resonance in nanoparticles. Instead of using high-power focused lasers to achieve localized heating, the system uses electromagnetic radiation at specific frequencies that resonantly excite the nanoparticles, converting optical energy to thermal energy more efficiently. This substitution reduces power consumption and eliminates the need for complex high-power laser focusing systems.

The patent applies local quality by creating spatially non-uniform temperature fields through nanoparticle distribution. Each nanoparticle creates a localized high-temperature zone that maintains optimal conditions for high-quality film deposition. This localized thermal environment ensures that even at sub-micron line widths, the deposition occurs under controlled conditions that preserve film quality, preventing the degradation that occurs in conventional uniform heating processes.

The patent applies preliminary action by pre-distributing metallic nanoparticles on the substrate before the deposition process. These nanoparticles are positioned in advance to define the desired pattern and line widths. During deposition, the nanoparticles immediately begin localized heating, ensuring that the chemical reactions occur precisely where needed from the start. This preliminary positioning eliminates the need for iterative adjustments and maintains film quality at small dimensions.