Plasmonic Nano Probe Spring Structure for Uniform Gap Control
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Solution Overview
Problem
Current optical systems face challenges in achieving high integration density for semiconductor circuits due to limitations in resolution and maintaining uniformity in the distance between nano-scale probes and the film to be exposed, which hinders the effective application of plasmonic effects for fine pattern fabrication.
Innovation Solution
A contact type plasmonic optical probe with a truncated probe tip coated with a thin metal film, featuring a nano aperture and a spring structure to maintain contact and uniform distance, along with a dielectric fill and protection layer, is used to enhance light transmittance and exposure uniformity, fabricated using a silicon process for high uniformity and productivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a parallel probe configuration is used to increase productivity, then the output per unit time is improved, but it becomes difficult to control the gap between each probe and the film to be exposed below several ten nm
Solution Approach 1:
A buffer layer is introduced as an intermediary element between the probe and the film to be exposed. This buffer layer acts as a mediator that maintains a uniform gap distance of several ten nm across all parallel probes, enabling precise gap control while preserving the high productivity benefits of parallel probe configuration
Solution Approach 2:
The gap distance parameter is standardized and optimized to several ten nm through the buffer layer structure. This parameter change enables uniform exposure conditions across multiple parallel probes while maintaining the near-field effect, resolving the contradiction between productivity and precision
2Illumination intensity
If the distance between the optical structure and the film to be exposed is reduced below several ten nm to generate near-field, then the light transmittance is improved, but it becomes difficult to maintain uniform distance across all parallel probes
Solution Approach 1:
The buffer layer serves as a mediator that enables the optical structure to maintain a stable, uniform distance of several ten nm from the film across all parallel probes. This intermediary structure ensures consistent near-field conditions while preserving distance uniformity
Solution Approach 2:
The system is segmented into distinct functional layers including the buffer layer that specifically manages the gap distance. This segmentation allows independent optimization of the buffer layer thickness to achieve uniform distance maintenance across the entire parallel probe array
3Length of stationary object
If conventional methods are used to maintain distance with immersion material layer or wall, then some distance control is achieved, but uniform distance maintenance between all parallel probes and the film cannot be ensured
Solution Approach 1:
The buffer layer is introduced as a dedicated intermediary structure that uniformly maintains the gap distance between all parallel probes and the film. This intermediary approach overcomes the limitations of conventional immersion material layers or walls that cannot ensure uniformity across multiple probes
Solution Approach 2:
The buffer layer is designed with uniform thickness and material properties to ensure homogeneous gap maintenance across the entire parallel probe array. This homogeneity ensures that all probes operate under identical near-field conditions, achieving both distance control and uniformity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables improved light transmittance and uniform exposure, allowing for accurate fabrication of fine patterns with high integration density and reduced fabrication costs, while maintaining the integrity of nano apertures and ensuring high-speed lithographic processes.
Implementation Method 1
the plasmonic effect is a phenomenon that transmittance of the light passed through the hole of nm diameter disposed in a metal film is remarkably increased
Data Source
AI summary
A contact type plasmonic nano optical probe, a parallel probe constituted of the same, a plasmonic optical apparatus including the parallel probe, and a method of fabricating the parallel probe are disclosed. A contact type plasmonic nano optical probe includes a probe tip which protrudes in a truncated shape having a narrower plan surface and a wider plan surface relatively wider than the narrower plan surface, of which a metal thin film is coated on a surface, of and which an aperture of nm diameter included in a portion of the metal thin film on a central portion of the narrower plan surface, a spring structure disposed at a perimeter of the probe tip and configured to maintain a distance between the probe tip and a film to be exposed, a dielectric filled within the aperture, and a protection layer disposed on the narrower plan surface of the probe tip. Here, an optical transport path is included within the probe tip to be connected to the aperture. A plasmonic optical apparatus including a parallel plasmonic probe is constituted of a probe array including a plurality of probe modules in which the contact type plasmonic nano optical probes are disposed at a uniform distance on a substrate.