Plasmonic Nanolithography Stamp Manufacturing via Segmented Buffer Layer

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Solution Overview

Problem

Conventional nanoimprint lithography techniques face challenges in forming precise micro patterns without thermal deformation and contamination, especially when dealing with complex structures and limited resin filling, which affects the quality of the final pattern.

Innovation Solution

A method for manufacturing a stamp for a plasmonic nanolithography apparatus involves forming metal patterns on a substrate, coating a hydrophobic thin film, selectively hydrophilic processing, laminating a buffer layer, and transferring the metal patterns to a light transmission base, with an adhesion preventing layer to facilitate easy release and prevent contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a master pattern is used in UV nanoimprint process, then high precision pattern transfer is achieved, but the master is frequently contaminated due to direct contact with resin

Engineering Contradiction:

Improvepattern transfer precisionVSAvoidmaster contamination

Core Design Contradiction:

Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The invention divides the master pattern into two separate components: a master mold that defines the pattern and a stamp that contacts the resin. The master mold is transferred to a buffer layer, which is then transferred to the stamp. This segmentation allows the master mold to remain isolated from resin contamination while still achieving precise pattern transfer through the intermediary stamp.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The invention introduces a buffer layer as an intermediary medium between the master mold and the stamp. The buffer layer receives the pattern from the master mold and transfers it to the stamp, serving as a mediator that prevents direct contact between the master mold and resin, thereby preventing contamination while maintaining pattern fidelity.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Manufacturing precision

If the master pattern has a complicated structure, then high precision patterning is achieved, but resin is not sufficiently filled in the master pattern

Engineering Contradiction:

Improvepattern qualityVSAvoidresin filling efficiency

Core Design Contradiction:

Manufacturing precisionVSEase of manufacture

Solution Approach 1:

Instead of filling resin directly into the complex master pattern cavity, the invention inverts the approach by forming the pattern on the outer surface of the stamp. The stamp with the transferred pattern is then used to imprint the resin, allowing resin to be pushed into the pattern rather than filling from above, which improves filling efficiency for complex structures.

Inventive Principle:

Principle #13The other way round (Inversion)

3Strength

If hydrophobic processing is applied to metal patterns, then adhesion to substrate is improved, but selective hydrophilic processing becomes more difficult

Engineering Contradiction:

Improveadhesion strengthVSAvoidselective processing ease

Core Design Contradiction:

StrengthVSEase of manufacture

Solution Approach 1:

The invention applies different surface properties to different regions of the metal pattern. The top surface of the metal pattern is selectively hydrophilically processed to enable adhesion to the buffer layer, while the side surfaces remain hydrophobic to prevent adhesion and facilitate clean separation during the transfer process. This local differentiation of surface properties resolves the contradiction between adhesion strength and selective processing ease.

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the formation of micro patterns without the limitations of light diffraction, ensuring precise pattern transfer and easy release of the stamp from the resist, while maintaining the quality of the pattern and preventing contamination.

Implementation Method 1

metal patterns having a plasmonic resonance characteristic... convert ultraviolet rays generated by the light source into Plasmon energy

Methodology Applied

Scientific EffectPlasmonic resonance: Resonance

Implementation Method 2

coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces

Methodology Applied

Scientific EffectHydrophobic processing: Hydrophobe

Implementation Method 3

selectively hydrophilic processing only the external surfaces of the metal patterns

Methodology Applied

Scientific EffectHydrophilic processing: Hydrophile

Implementation Method 4

resin is filled in a pattern by capillary force

Methodology Applied

Scientific EffectCapillary force: Capillary Action

Data Source

PatentUS9028639B2Method of manufacturing stamp for plasmonic nanolithography apparatus and plasmonic nanolithography apparatus

Publication Date: 2015.05.12 KOREA INST OF MACHINERY & MATERIALS

AI summary

There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.