Plate Charging Contactor for Ozone-Free Particle Removal

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Solution Overview

Problem

In substrate processing apparatuses, such as lithography and imprint apparatuses, particles adhering to the mold and substrate can lead to defective patterns and reduced mold lifespan due to direct contact, and existing corona discharge methods for particle removal generate ozone, causing oxidation and degradation of components.

Innovation Solution

A container with a charging unit that contacts and charges a plate using a contactor to supply electric charges, allowing for effective particle removal without ozone generation, using a contactor that applies voltage and separates to charge the plate efficiently.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If corona discharge method is used to charge the wafer for particle removal, then particles can be attracted and collected, but ozone is generated causing oxidation and degradation of substrate and apparatus parts

Engineering Contradiction:

Improveparticle removal effectivenessVSAvoidozone oxidation damage

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent replaces the corona discharge method (electrical field-based charging) with a contact-based charging method using a contactor that touches the wafer surface. This mechanical contact approach supplies electric charges directly to the wafer without generating ozone, thus eliminating the oxidation damage while maintaining particle removal effectiveness

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces a contactor as an intermediary component between the power supply and the wafer. The contactor serves as a mediator that transfers electric charges to the wafer through direct contact, avoiding the need for corona discharge and preventing ozone generation that would otherwise damage the substrate and apparatus

Inventive Principle:

Principle #24Intermediary (Mediator)

2Reliability

If corona discharge method is used to charge the wafer, then particles can be removed effectively, but the electrode needle degrades due to oxidation generating dust

Engineering Contradiction:

Improveparticle removal effectivenessVSAvoidelectrode needle lifespan

Core Design Contradiction:

ReliabilityVSDuration of action of stationary object

Solution Approach 1:

The patent replaces the corona discharge electrode needle with a contactor that makes direct mechanical contact with the wafer. This substitution eliminates the oxidation degradation that occurs in corona discharge methods, extending the lifespan of the charging component while maintaining effective particle removal capability

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The contactor is designed as a replaceable component that can be easily replaced when worn, serving as a cost-effective alternative to maintaining expensive electrode needles that degrade through oxidation during corona discharge operations

Inventive Principle:

Principle #27Cheap short-living objects (Disposable)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively removes particles from the apparatus, preventing pattern defects and extending mold life while avoiding component oxidation, ensuring reliable substrate processing.

Implementation Method 1

a contactor configured to be in contact with the plate, and configured to charge the plate by supplying electric charges to the plate via the contactor

Methodology Applied

Scientific EffectElectrostatic induction: Electrostatic Induction

Data Source

PatentUS11798818B2Container, processing apparatus, particle removing method, and method of manufacturing article

Publication Date: 2023.10.24 CANON KK

AI summary

The present invention provides a container for containing a plate to be used to remove particles in a processing apparatus for processing a substrate, comprising: a charging unit configured to charge the stored plate, wherein the charging unit includes a contactor configured to be in contact with the plate, and is configured to charge the plate by supplying electric charges to the plate via the contactor and then separating the contactor from the plate.