Platen-Based Liquid Application System for Microscope Slide Staining
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Solution Overview
Problem
Current automated microscope slide staining systems are inadequate for advanced staining protocols like immunohistochemical (IHC) and in situ hybridization (ISH) due to reagent carryover, lack of temperature control, and inefficient reagent management, which leads to contamination, increased waste, and reduced throughput.
Innovation Solution
A platen-based system with a liquid application station and a stripping element featuring an intersecting gap and air barrier is used to efficiently apply and remove liquids from microscope slides, incorporating microfluidic forces to minimize residual reagents and segregate waste, while allowing for temperature control and flexibility in staining protocols.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If automated dip and dunk staining instruments are used to increase throughput and consistency, then productivity is improved, but reagent carryover between containers occurs leading to contamination and degradation of reagents
Solution Approach 1:
The patent introduces a platen as an intermediary surface between reagent containers and microscope slides. The platen receives liquid from reservoirs and transfers it to slides through capillary action, preventing direct contact between slides and reagent containers. This intermediary mechanism eliminates reagent carryover while maintaining automated high-throughput processing.
2Manufacturing precision
If repeated washing steps are implemented to remove residual reagents, then purity is improved, but additional laboratory waste is generated and expense increases
Solution Approach 1:
The patent extracts the washing function from the staining process by using a platen that allows complete drainage of liquid from slides. The platen's surface geometry and capillary channels enable residual reagent removal without requiring multiple washing steps, thereby eliminating waste generation while achieving the desired purity.
3Ease of operation
If platen-based systems are used for simple staining protocols, then ease of operation is improved, but they cannot remove residual reagent volumes required for sophisticated staining protocols
Solution Approach 1:
The patent modifies the platen's physical parameters including surface energy, capillary channel dimensions, and surface geometry to optimize liquid removal. By adjusting these parameters, the system achieves effective residual reagent removal for sophisticated staining protocols while maintaining ease of operation and simplicity.
4Productivity
If traditional automated staining systems are used, then productivity is improved, but temperature control is inadequate for advanced IHC and ISH protocols
Solution Approach 1:
The patent segments the platen into multiple independently controlled heating zones that can be maintained at different temperatures. This segmentation allows simultaneous optimization of temperature control for different staining steps while maintaining automated high-throughput processing capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system significantly reduces reagent carryover, minimizes waste, and enhances throughput by effectively managing liquid application and removal, enabling more advanced staining protocols with improved consistency and efficiency.
Implementation Method 1
A capillary space is defined between a substantially flat surface of the substrate and a substantially flat surface of the liquid application station
Implementation Method 2
the stripping element includes an intersecting gap and an air barrier
Implementation Method 3
the stripping element includes an intersecting gap and an air barrier
Data Source
AI summary
A platen for contacting a liquid to a surface of a substantially flat substrate is disclosed. The platen includes a liquid application station and a stripping element at an end of the liquid application station, wherein the stripping element includes an intersecting gap and an air barrier. Also disclosed are an apparatus including the platen and a method of using the platen to contact a substrate with a liquid.