Plating Apparatus Flow Dynamics for Thickness Uniformity

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Solution Overview

Problem

Conventional injection plating apparatuses face issues with non-uniform plating thickness due to varying liquid feed areas on the plating object, leading to increased complexity and cost from the need for additional mechanisms like rotating cathode members and multiple nozzles.

Innovation Solution

A plating apparatus design where the plating liquid flows into a space between the anode and cathode from above and is sucked from below, enhancing flow rate and uniformity without requiring nozzles or a driving mechanism, thus simplifying and downsizing the system.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If injection plating is used to improve productivity and prevent plating defects, then plating productivity is improved and plating defects are prevented, but non-uniform plating thickness occurs due to varying liquid feed areas

Engineering Contradiction:
Improveplating productivityVSAvoidplating thickness uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The cathode member is rotated during the plating process to dynamically change the relative position between the plating object and the liquid feed area. This rotation ensures that all areas of the plating object receive uniform liquid supply over time, solving the non-uniform plating thickness problem while maintaining the high productivity benefits of injection plating

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If nozzles and driving mechanism are added to improve plating thickness uniformity, then plating thickness uniformity is improved, but device complexity and size increase, resulting in higher costs

Engineering Contradiction:
Improveplating thickness uniformityVSAvoidapparatus configuration complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The cathode member serves dual functions: it acts as both the electroplating cathode electrode and the rotating mechanism to ensure uniform liquid distribution. By combining these functions into a single component, the invention achieves uniform plating thickness without requiring separate nozzles and driving mechanisms, thereby avoiding increased device complexity and cost

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design improves plating thickness uniformity, reduces costs by eliminating the need for additional mechanisms, and prevents plating defects by ensuring uniform liquid distribution and efficient liquid circulation.

Implementation Method 1

a pump arranged outside the space, the pump moving the plating liquid

Methodology Applied
Scientific EffectPump: Pump

Implementation Method 2

the plating liquid flows into the space from above relative to the space and is sucked by a pump from below relative to the space

Methodology Applied
Scientific EffectGravity-driven flow: Gravitation

Data Source

PatentEP3144417B1Plating apparatus and container bath
Publication Date: 2019.09.18 YAMAMOTO MS
  • EP3144417B1 patent drawingFigure 1
  • EP3144417B1 patent drawingFigure 2
  • EP3144417B1 patent drawingFigure 3

AI summary

Provided are a plating apparatus and a container bath, which have a simpler structure than a conventional system and are capable of improving uniformity of a plating thickness. The plating apparatus (M) includes a plating tank (10) which stores a plating liquid (F), a cathode member (20) arranged inside the plating tank (10), a plating object (W) arranged inside the plating tank (10) to face the cathode member (20), an anode jig (30) which contacts with the plating object (W), and a space (40) formed between the cathode member (20) and the plating object (W) to be a flow passage to which the plating liquid (F) flows from the plating tank (10). The plating liquid (F) flows into the space (40) from above relative to the space (40), and is sucked by a pump (50) from below relative to the space (40).