Pleated Substrate Web Track in Atomic Layer Deposition Reactor
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Solution Overview
Problem
In atomic layer deposition reactors, existing methods face challenges in efficiently forming a substrate web track with a repeating pattern within a reaction vessel, which limits the reduction of surfaces that need cleaning and affects the uniformity of thin film deposition.
Innovation Solution
A method involving the movement of a first set of support rolls relative to a second set of support rolls to form a substrate web track with a repeating pattern inside a reaction vessel, supported by both sets of rolls, and the use of a dual-lid system to facilitate precursor vapor feeding and gas removal, creating a three-dimensional atomic layer deposition flow volume.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a substrate web track is formed using conventional methods in an atomic layer deposition reactor, then the deposition process can be performed, but the area requiring cleaning after processing is large and the uniformity of thin film deposition is compromised
Solution Approach 1:
The patent introduces a third dimension by forming a pleated substrate web track that extends vertically within the reaction vessel, transforming the traditional planar deposition approach into a three-dimensional configuration. This vertical pleated structure increases the effective deposition area within the vessel while maintaining uniform film quality through controlled precursor distribution along the pleats.
Solution Approach 2:
The substrate web track is segmented into multiple pleats or folds, creating a series of parallel channels that distribute the precursor vapor flow more uniformly across the substrate web. This segmentation allows better control over deposition uniformity while the pleated structure itself forms a compact three-dimensional configuration that reduces the total surface area requiring post-processing cleaning.
2Manufacturing precision
If the substrate web track is formed with a repeating pattern using moving support rolls, then the deposition uniformity is improved, but the device complexity increases
Solution Approach 1:
The patent employs movable support rolls that can dynamically adjust their position and movement to form the pleated substrate web track. The support rolls are designed to move in a coordinated manner, with at least one roll capable of translational motion, allowing the formation of the repeating pleated pattern. This dynamic capability enables precise control over track geometry while maintaining a relatively simple mechanical implementation through standard roll mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the area requiring cleaning and enhances the uniformity of thin film deposition by forming a pleated substrate web track, allowing for efficient gas removal and precursor distribution, thereby improving the deposition process.
Implementation Method 1
forming a substrate web track with a repeating pattern into a reaction vessel of an atomic layer deposition reactor by moving a first set of support rolls in relation to a second set of support rolls
Implementation Method 2
ALD is a special chemical deposition method based on the sequential introduction of at least two reactive precursor species to at least one substrate
Implementation Method 3
in an experiment aluminum oxide has been grown by thermal ALD from trimethylaluminum (CH3)3Al, also referred to as TMA, and water
Implementation Method 4
precursor vapor is fed into the reaction chamber (or vessel) through the reaction chamber (or vessel) lid
Implementation Method 5
forming inside the reaction vessel a three-dimensional atomic layer deposition flow volume defined by a reaction vessel lid, reaction vessel sidewalls and the formed substrate web track
Data Source
AI summary
An apparatus and method for forming a substrate web track with a repeating pattern into a reaction space of a deposition reactor by moving a first set of support rolls in relation to a second set of support rolls.