Pneumatic Shutter Control for Stable Chamber Gap in Substrate Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing shutter apparatuses in substrate treating apparatuses suffer from backlash issues due to rack-pinion structure distortions, leading to particle defects on substrates during baking processes, which are exacerbated by gaps and interference between the chamber and shutter.
Innovation Solution
A shutter apparatus with a cylinder-driven mechanism that utilizes controlled pneumatic pressures, including positive and back pressures, to manage rotational speed and direction, minimizing backlash through an air cushion effect, thereby maintaining a consistent gap and reducing particle generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a rack-pinion structure is used to drive the rotary cylinder, then the shutter can be operated, but backlash occurs due to distortion, causing location errors and particle generation
Solution Approach 1:
The patent replaces the mechanical rack-pinion drive system with a pneumatic cylinder system. The pneumatic cylinder directly drives the rotary cylinder without mechanical gears, eliminating backlash and distortion issues. This substitution of mechanical components with pneumatic components resolves the location precision problem while maintaining operational capability.
Solution Approach 2:
The patent employs pneumatic pressure control to drive the shutter mechanism. By using compressed air through solenoid valves to control the pneumatic cylinder, the system achieves precise positioning without mechanical backlash. The pneumatic system provides smooth, distortion-free movement of the rotary cylinder.
2Volume of moving object
If the gap between the chamber and shutter is reduced to 0, then space is optimized, but particles are generated due to interference and repeated impacts from backlash
Solution Approach 1:
By replacing the mechanical rack-pinion system with a pneumatic drive system, the patent eliminates backlash that causes repeated impacts between the shutter and chamber. Without mechanical gear distortion, the shutter maintains stable positioning even at minimal gaps, preventing particle generation from impacts.
Solution Approach 2:
The pneumatic system provides inherent cushioning through compressible air, preventing hard impacts between the shutter and chamber. The pneumatic pressure acts as a cushion that absorbs shocks and prevents repeated impacts, allowing the gap to be minimized without generating particles.
3Object-generated harmful factors
If a gap of 3 mm is maintained between the chamber and shutter, then particle generation is prevented, but space is wasted and the gap may vary due to backlash
Solution Approach 1:
The pneumatic drive system replaces the mechanical rack-pinion system, eliminating backlash that causes gap variation. This allows the gap to be consistently maintained at a minimal value without the need for excessive clearance, optimizing space while preventing particle generation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents backlash and maintains a stable gap between the shutter and chamber, reducing particle defects and ensuring consistent substrate quality in baking processes.
Implementation Method 1
utilizes controlled pneumatic pressures, including positive and back pressures, to manage rotational speed and direction, minimizing backlash through an air cushion effect
Data Source
AI summary
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a process chamber having an opening, a shutter that opens and closes the opening through a rotation thereof, and a shutter driver having a cylinder that opens and closes the shutter, and the shutter driver includes a controller that controls a pneumatic pressure provided to the cylinder such that, when the shutter is rotated from an opening location to a closing location, a rotational speed of the shutter in a first rotation section including the opening location and a rotational speed of the shutter in a second rotation section including the closing location are different.


